Tuning the work function of graphene by nitrogen plasma treatment with different radio-frequency powers

Jian Jhou Zeng, Yow Jon Lin

研究成果: Article同行評審

20 引文 斯高帕斯(Scopus)

摘要

Graphene prepared by the chemical vapor deposition method was treated with nitrogen plasma under different radio-frequency (rf) power conditions in order to experimentally study the change in the work function. Control of the rf power could change the work function of graphene from 4.91 eV to 4.37 eV. It is shown that the increased rf power may lead to the increased number of graphitic nitrogen, increasing the electron concentration, and shifting the Fermi level to higher energy. The ability to controllably tune the work function of graphene is essential for optimizing the efficiency of optoelectronic and electronic devices.

原文English
文章編號233103
期刊Applied Physics Letters
104
發行號23
DOIs
出版狀態Published - 2014 六月 9

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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