The influence of cross-tie wall on the magnetoresistance of patterned permalloy films

J. C. Wu, H. M. Lee

研究成果: Conference article

摘要

The influence of cross-tie wall on the magnetoresistance (MR) of patterned permalloy films was discussed. The influence of the magnetic domain structure on the MR curve and the aspect ratio dependence of coercive or saturation fields was also discussed. The higher aspect ratios of the device had shown single domain configuration and a sharp transition in MR curves.

原文English
頁(從 - 到)EU09
期刊Digests of the Intermag Conference
出版狀態Published - 2002 十二月 1
事件2002 IEEE International Magnetics Conference-2002 IEEE INTERMAG - Amsterdam, Netherlands
持續時間: 2002 四月 282002 五月 2

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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