The influence of cross-tie wall on the magnetoresistance of patterned permalloy films

J. C. Wu, H. M. Lee

研究成果: Conference contribution

摘要

Driven by the potential applications in data storage and the understanding of the fundamental micromagnetism, nanostructured magnetic thin films have been under intensive investigation. The recent advances in the nanofabrication and microscopy of the magnetic domain structures have led to more optimization of the magnetic field sensors. We present a correlation between the magnetization evolution in patterned elliptical Permalloy elements and their corresponding magnetoresistance (MR).

原文English
主出版物標題INTERMAG Europe 2002 - IEEE International Magnetics Conference
編輯J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, Jo De Boeck, R. Wood
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)0780373650, 9780780373655
DOIs
出版狀態Published - 2002 一月 1
事件2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands
持續時間: 2002 四月 282002 五月 2

出版系列

名字INTERMAG Europe 2002 - IEEE International Magnetics Conference

Other

Other2002 IEEE International Magnetics Conference, INTERMAG Europe 2002
國家Netherlands
城市Amsterdam
期間02-04-2802-05-02

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Surfaces, Coatings and Films

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    Wu, J. C., & Lee, H. M. (2002). The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. 於 J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, J. De Boeck, & R. Wood (編輯), INTERMAG Europe 2002 - IEEE International Magnetics Conference [1001217] (INTERMAG Europe 2002 - IEEE International Magnetics Conference). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2002.1001217