Source-end layouts on ESD/LU reliabilities in an HV 0.25 um 60 v nLDMOS

Shen Li Chen, Min Hua Lee, Tzung Shian Wu, Yi Sheng Lai, Chun Ju Lin, Hsun-Hsiang Chen

研究成果: Conference contribution

5 引文 斯高帕斯(Scopus)

指紋 深入研究「Source-end layouts on ESD/LU reliabilities in an HV 0.25 um 60 v nLDMOS」主題。共同形成了獨特的指紋。

Engineering & Materials Science