Magnetic domain patterns of rectangular and elliptic arrays of small permalloy elements

S. H. Liou, R. F. Sabiryanov, S. S. Jaswal, J. C. Wu, Y. D. Yao

研究成果: Article

26 引文 斯高帕斯(Scopus)

摘要

Magnetic domain patterns of two series of soft magnetic arrays are studied as functions of the aspect ratios. The magnetic images are obtained by using MFM with low magnetic stray field and high-coercivity MFM tips. A 30 nm thick layer of Ni80Fe20 alloy is prepared by thermal evaporation and electron beam lithography and lift-off patterning technique on a silicon substrate. The effect of the edge roughness and initial conditions on the magnetic domain patterns is compared with the results obtained by micromagnetic simulations. This comparison clearly shows that the domain structure is related to the edge roughness.

原文English
頁(從 - 到)1270-1272
頁數3
期刊Journal of Magnetism and Magnetic Materials
226-230
發行號PART II
DOIs
出版狀態Published - 2001 一月 1

    指紋

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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