Influences of the aspect ratio and film thickness on switching properties of elliptical permalloy elements

C. C. Chang, Y. C. Chang, W. S. Chung, J. C. Wu, Z. H. Wei, M. F. Lai, C. R. Chang

研究成果: Article

15 引文 斯高帕斯(Scopus)

摘要

The size dependence on the switching properties of microstructured Permalloy (Ni80Fe20) ellipses were investigated by magnetoresistance measurements and magnetic force microscopy. Elements with fixed short axes of 1 μm, long axes varying from 2 to 10 μm, and film thickness varying from 8 to 55 nm were fabricated by electron beam lithography through a lift-off technique. A single-domain configuration was observed in the elements with the range of aspect ratios (long/short axis) from 5 to 10. More complex domain structures appear in the lower aspect ratio and thicker samples. The switching properties show a strong dependence on the film thickness as well as the aspect ratio. The switching fields of uniform magnetization reversal increase with increasing thickness up to a critical value (24 < tc < 40 nm), whereas they decrease with increasing thickness above t c. Nevertheless, the switching fields only show weak dependency on aspect ratio.

原文English
頁(從 - 到)947-949
頁數3
期刊IEEE Transactions on Magnetics
41
發行號2
DOIs
出版狀態Published - 2005 二月 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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