Hollow optical waveguides with omni-directional reflectors

Shih Shou Lo, Chia Hong Hou, Hung Ta Chien, Fu-Li Hsiao, Chii Chang Chen

研究成果: Conference article同行評審

摘要

In this study, we design and fabricate a hollow optical waveguide with omni-directional reflectors in silicon-based materials. A groove is etched by inductive coupled plasma (ICP) with photolithographic process on (100) silicon wafer. The width of the groove is varied from 3.5 to 5.5 micrometer for different waveguide designs. The depth of the groove is 1.2micrometers. Plasma enhanced chemical vapor deposition is used to deposit six pairs of Si/SiO 2(0.111/0.258micrometers) on the samples. Finally, the top of the sample is covered by another silicon substrate on which the identical omni-directional reflector has been also deposited. By wafer bonding technology, the top omni-directional reflector can be combined with the groove to form a hollow optical waveguide. Light with the wavelength at 1.55 micrometers can be confined by the omni-directional reflectors at single mode operation. Polarization independent hollow optical waveguides can be achieved with this fabrication process.

原文English
文章編號22
頁(從 - 到)188-191
頁數4
期刊Progress in Biomedical Optics and Imaging - Proceedings of SPIE
5730
DOIs
出版狀態Published - 2005 七月 21
事件Optoelectronic Integration on Silicon II - San Jose, CA, United States
持續時間: 2005 一月 252005 一月 26

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Atomic and Molecular Physics, and Optics
  • Radiology Nuclear Medicine and imaging

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