Enhance Extreme UltraViolet Lithography mask inspection contrast by using Fabry-Perot type antireflective coatings

H. C. Cheng, H. L. Chen, T. S. Ko, L. J. Lai, F. H. Ko, T. C. Chu

研究成果: Conference contribution

摘要

In this paper, we demonstrate two antireflective coatings (ARC) structures enable the absorber stacks to meet the exposure and inspection requirements at the same time. The absorber stack is comprised of TaN or Cr and a single-layer antireflective coatings. Si/sub 3/N/sub 4/ layer is shown with lower reflectance and higher inspection contrast than SiO/sub 2/ layer. Fabry-Perot type ARC structures perform better contrast and thickness variation tolerance than the single-layer ARC structure.

原文English
主出版物標題Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
發行者Institute of Electrical and Electronics Engineers Inc.
頁面94-95
頁數2
ISBN(電子)4891140402, 9784891140403
DOIs
出版狀態Published - 2003 一月 1
事件International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan
持續時間: 2003 十月 292003 十月 31

出版系列

名字Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Other

OtherInternational Microprocesses and Nanotechnology Conference, MNC 2003
國家Japan
城市Tokyo
期間03-10-2903-10-31

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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