Effect of annealing temperature on exchange coupling in NiFeFeMn and FeMnNiFe systems

Kuang Ching Chen, Y. H. Wu, Kuo Ming Wu, Jong-Ching Wu, Lance Horng, S. L. Young

研究成果: Article同行評審

18 引文 斯高帕斯(Scopus)

摘要

Most studies on exchange bias in spin valves are for antiferromagnetic/ ferromagnetic structures, and Fe [50] Mn [50] Ni [79] Fe [21] is widely used. The results of the exchange-bias field (Hex) and coercivity (Hc) as a function of the annealing temperature in NiFeFeMn and FeMnNiFe systems are given in the study. We prepare two types of films, type I: substrate/ TaNiFeFeMnTa and type II: substrate/ TaFeMnNiFeTa, respectively. Annealing was performed at 150-450 °C under 720 Oe for 2 h, Hex and Hc of type I samples increase slightly with the increase of the annealing temperature. But Hex and Hc of type II samples increase rapidly after annealing over 300 °C, then decrease after annealing at 375 °C. The strong exchange-bias field and low coercivity were exhibited for type I samples, where NiFe is the buffer layer and is also the pinned layer. In type II samples, the increase in the exchange-bias field is attributed to the altered interface of FeMnNiFe due to interdiffusion. The interpretation of the fluctuation of the magnetic properties for these two types of films in connection with the crystalline texture and morphology by x-ray scattering technologies as well as atomic force microscopy was given. This research leads to a better understanding of the annealing temperature and microstructures in the two types of bilayers.

原文English
文章編號09E516
期刊Journal of Applied Physics
101
發行號9
DOIs
出版狀態Published - 2007 五月 22

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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