Design rule and orientation layout for MEMS curved beams on silicon

Tzung-Ming Chen, Zhenyu Liu, Jan G. Korvink, Ulrike Wallrabe

研究成果: Article

4 引文 斯高帕斯(Scopus)

摘要

An analysis method used to choose a suitable structural orientation layout for a microcompliant mechanism, which includes multi-curved-beams, is introduced, particularly, for fabricating microelectromechanical-systems (MEMS) thin-curved-beam microstructures on (100) and (111) single-crystal silicon (SCS) wafers. The achievement of a large deflection of a fabricated SCS device verifies the usability of this design rule. The orientation layouts of the device for a large deflection are restricted to a specific region. Based on the analysis method, it is better to follow a 21° safe region between the (100) and (110) orientations in order to decrease the possibility of crystal slip failure. Using this design consideration, one can design more robust MEMS compliant mechanisms from SCS, exploiting its ideal elasticity.

原文English
文章編號5462829
頁(從 - 到)706-714
頁數9
期刊Journal of Microelectromechanical Systems
19
發行號3
DOIs
出版狀態Published - 2010 六月 1

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering
  • Electrical and Electronic Engineering

指紋 深入研究「Design rule and orientation layout for MEMS curved beams on silicon」主題。共同形成了獨特的指紋。

  • 引用此