An optimization design in the HV nLDMOS by Taguchi method

Shen Li Chen, Tzung Shian Wu, Yun Ru Chen, Hung Wei Chen, Chun Hsing Shih, H. H. Chen

研究成果: Conference article

1 引文 斯高帕斯(Scopus)

摘要

This paper applied the Taguchi method to simulate the latch-up effect of nLDMOS to achieve an optimization design. The applied model is for an nLDMOS structure with high voltage well plus the adaptive (adjustment) layers of source & drain, and an N-type buried layer. Although the methods we could choose is abundant, we hope to effectively obtain the data which is useful for statistics in order to judge the correct characteristic of parameters. We applied the Taguchi method to perform an optimization in the paper. There are six parameters with two levels in this work, so we choose the Taguchi table to be L 8(2 7). By this way, it can decrease the times of experiment much effectively.

原文English
頁(從 - 到)81-84
頁數4
期刊Advanced Materials Research
482-484
DOIs
出版狀態Published - 2012 四月 4
事件3rd international Conference on Manufacturing Science and Engineering, ICMSE 2012 - Xiamen, China
持續時間: 2012 三月 272012 三月 29

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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