A GaAs/AlAs wet selective etch process for the gate recess of GaAs power metal-semiconductor field-effect transistors

E. Y. Chang, Yeong Lin Lai, Y. S. Lee, S. H. Chen

研究成果: Article

11 引文 斯高帕斯(Scopus)

指紋 深入研究「A GaAs/AlAs wet selective etch process for the gate recess of GaAs power metal-semiconductor field-effect transistors」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science