Tuning the work function of graphene by nitrogen plasma treatment with different radio-frequency powers

Jian Jhou Zeng, Yow Jon Lin

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

Graphene prepared by the chemical vapor deposition method was treated with nitrogen plasma under different radio-frequency (rf) power conditions in order to experimentally study the change in the work function. Control of the rf power could change the work function of graphene from 4.91 eV to 4.37 eV. It is shown that the increased rf power may lead to the increased number of graphitic nitrogen, increasing the electron concentration, and shifting the Fermi level to higher energy. The ability to controllably tune the work function of graphene is essential for optimizing the efficiency of optoelectronic and electronic devices.

Original languageEnglish
Article number233103
JournalApplied Physics Letters
Volume104
Issue number23
DOIs
Publication statusPublished - 2014 Jun 9

Fingerprint

nitrogen plasma
radio frequencies
graphene
tuning
optoelectronic devices
vapor deposition
nitrogen
electronics
electrons
energy

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

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Tuning the work function of graphene by nitrogen plasma treatment with different radio-frequency powers. / Zeng, Jian Jhou; Lin, Yow Jon.

In: Applied Physics Letters, Vol. 104, No. 23, 233103, 09.06.2014.

Research output: Contribution to journalArticle

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