The morphology of etch pits on a sapphire surface

Che Ming Liu, Jyh Chen Chen, Yi Cheng Huang, Hung Lin Hsieh

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

In this work, the pits were successfully etched onto (0 0 0 1) or (1 1 over(2, -) 0) sapphire single crystal surfaces by using a Na2B4O7 solution. The difference in the morphology of etch pits on different planes of the sapphire was examined by atomic force microscopy measurements. It was found that the size of the etch pits was affected by the etching duration. The results of X-ray diffraction analysis also indicated the particular in-plane orientation of the etch pits on the sapphire surface. The relationship between the morphology of etch pit and the sapphire structure will be explained in the paper. In addition, the etching rates for the (0 0 0 1) and (1 1 over(2, -) 0) types of sapphire will be compared.

Original languageEnglish
Pages (from-to)572-575
Number of pages4
JournalJournal of Physics and Chemistry of Solids
Volume69
Issue number2-3
DOIs
Publication statusPublished - 2008 Feb 1

Fingerprint

Aluminum Oxide
Sapphire
sapphire
Etching
etching
Single crystal surfaces
crystal surfaces
X ray diffraction analysis
Atomic force microscopy
atomic force microscopy
single crystals
diffraction
x rays

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Liu, Che Ming ; Chen, Jyh Chen ; Huang, Yi Cheng ; Hsieh, Hung Lin. / The morphology of etch pits on a sapphire surface. In: Journal of Physics and Chemistry of Solids. 2008 ; Vol. 69, No. 2-3. pp. 572-575.
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The morphology of etch pits on a sapphire surface. / Liu, Che Ming; Chen, Jyh Chen; Huang, Yi Cheng; Hsieh, Hung Lin.

In: Journal of Physics and Chemistry of Solids, Vol. 69, No. 2-3, 01.02.2008, p. 572-575.

Research output: Contribution to journalArticle

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