Abstract
Microstructured permalloy ellipses have been fabricated using electron-beam lithography through a lift-off process. The investigations were focused on the magnetization configurations and switching processes adopting magnetic force microscopy (MFM) and magnetoresistance (MR) measurements. An original five-vortex domain configuration of ellipse can be controlled and manipulated to become a four-vortex domain configuration by tuning the external magnetic field applied along the short-axis direction. In addition, an asymmetrical reversal process can be demonstrated on an ellipse having two- or three-vortex domain configuration, in which the switching fields are 36 Oe and 24 Oe, respectively.
| Original language | English |
|---|---|
| Pages (from-to) | 3742-3744 |
| Number of pages | 3 |
| Journal | IEEE Transactions on Magnetics |
| Volume | 41 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - 2005 Oct 1 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering
Fingerprint Dive into the research topics of 'The irreversible magnetization process in microstructured permalloy ellipses'. Together they form a unique fingerprint.
Cite this
Chang, Y. C., Chang, C. C., & Wu, J. C. (2005). The irreversible magnetization process in microstructured permalloy ellipses. IEEE Transactions on Magnetics, 41(10), 3742-3744. https://doi.org/10.1109/TMAG.2005.854925