The investigation of solution process rubrene transistors under different annealing conditions

Yu Han Cheng, Ping Chieh Lai, Ping Yin Tsai, Kang Chih Fan, Yu Wu Wang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We investigated the characteristics transition of solution processed Rubrene transistors under various annealing temperature and concentrations. Rubrene has been proven as a high potential organic semiconductor. Solution process promises its application in large area coating and cost down. The fabricated device achieved a mobility ∼10-4 cm2/vs and on/off ratio ∼103.

Original languageEnglish
Title of host publication23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016
PublisherSociety for Information Display
Pages461-463
Number of pages3
ISBN (Electronic)9781510845510
Publication statusPublished - 2016 Jan 1
Event23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016 - Fukuoka, Japan
Duration: 2016 Dec 72016 Dec 9

Publication series

Name23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016
Volume1

Other

Other23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016
CountryJapan
CityFukuoka
Period16-12-0716-12-09

Fingerprint

Transistors
Annealing
Semiconducting organic compounds
Coatings
Costs
Temperature
rubrene

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Human-Computer Interaction
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Cheng, Y. H., Lai, P. C., Tsai, P. Y., Fan, K. C., & Wang, Y. W. (2016). The investigation of solution process rubrene transistors under different annealing conditions. In 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016 (pp. 461-463). (23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016; Vol. 1). Society for Information Display.
Cheng, Yu Han ; Lai, Ping Chieh ; Tsai, Ping Yin ; Fan, Kang Chih ; Wang, Yu Wu. / The investigation of solution process rubrene transistors under different annealing conditions. 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016. Society for Information Display, 2016. pp. 461-463 (23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016).
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abstract = "We investigated the characteristics transition of solution processed Rubrene transistors under various annealing temperature and concentrations. Rubrene has been proven as a high potential organic semiconductor. Solution process promises its application in large area coating and cost down. The fabricated device achieved a mobility ∼10-4 cm2/vs and on/off ratio ∼103.",
author = "Cheng, {Yu Han} and Lai, {Ping Chieh} and Tsai, {Ping Yin} and Fan, {Kang Chih} and Wang, {Yu Wu}",
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Cheng, YH, Lai, PC, Tsai, PY, Fan, KC & Wang, YW 2016, The investigation of solution process rubrene transistors under different annealing conditions. in 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016. 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016, vol. 1, Society for Information Display, pp. 461-463, 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016, Fukuoka, Japan, 16-12-07.

The investigation of solution process rubrene transistors under different annealing conditions. / Cheng, Yu Han; Lai, Ping Chieh; Tsai, Ping Yin; Fan, Kang Chih; Wang, Yu Wu.

23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016. Society for Information Display, 2016. p. 461-463 (23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016; Vol. 1).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Cheng YH, Lai PC, Tsai PY, Fan KC, Wang YW. The investigation of solution process rubrene transistors under different annealing conditions. In 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016. Society for Information Display. 2016. p. 461-463. (23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016).