The investigation of solution process rubrene transistors under different annealing conditions

Yu Han Cheng; Ping Chieh Lai; Ping Yin Tsai; Kang Chih Fan; Yu Wu Wang

The investigation of solution process rubrene transistors under different annealing conditions

Yu Han Cheng, Ping Chieh Lai, Ping Yin Tsai, Kang Chih Fan, Yu Wu Wang

Graduate Institute of Photonics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We investigated the characteristics transition of solution processed Rubrene transistors under various annealing temperature and concentrations. Rubrene has been proven as a high potential organic semiconductor. Solution process promises its application in large area coating and cost down. The fabricated device achieved a mobility ∼10^-4 cm²/vs and on/off ratio ∼10³.

Original language	English
Title of host publication	23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016
Publisher	Society for Information Display
Pages	461-463
Number of pages	3
ISBN (Electronic)	9781510845510
Publication status	Published - 2016 Jan 1
Event	23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016 - Fukuoka, Japan Duration: 2016 Dec 7 → 2016 Dec 9

Publication series

Name	23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016
Volume	1

Other

Other	23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016
Country	Japan
City	Fukuoka
Period	16-12-07 → 16-12-09

All Science Journal Classification (ASJC) codes

Hardware and Architecture
Human-Computer Interaction
Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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Cheng, Y. H., Lai, P. C., Tsai, P. Y., Fan, K. C., & Wang, Y. W. (2016). The investigation of solution process rubrene transistors under different annealing conditions. In 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016 (pp. 461-463). (23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016; Vol. 1). Society for Information Display.

Cheng, Yu Han ; Lai, Ping Chieh ; Tsai, Ping Yin ; Fan, Kang Chih ; Wang, Yu Wu. / The investigation of solution process rubrene transistors under different annealing conditions. 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016. Society for Information Display, 2016. pp. 461-463 (23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016).

@inproceedings{06e2e2659f5f4c55956ccfbcbd44c3f1,

title = "The investigation of solution process rubrene transistors under different annealing conditions",

abstract = "We investigated the characteristics transition of solution processed Rubrene transistors under various annealing temperature and concentrations. Rubrene has been proven as a high potential organic semiconductor. Solution process promises its application in large area coating and cost down. The fabricated device achieved a mobility ∼10-4 cm2/vs and on/off ratio ∼103.",

author = "Cheng, {Yu Han} and Lai, {Ping Chieh} and Tsai, {Ping Yin} and Fan, {Kang Chih} and Wang, {Yu Wu}",

year = "2016",

month = jan,

day = "1",

language = "English",

series = "23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016",

publisher = "Society for Information Display",

pages = "461--463",

booktitle = "23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016",

address = "United States",

note = "23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016 ; Conference date: 07-12-2016 Through 09-12-2016",

}

Cheng, YH, Lai, PC, Tsai, PY, Fan, KC & Wang, YW 2016, The investigation of solution process rubrene transistors under different annealing conditions. in 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016. 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016, vol. 1, Society for Information Display, pp. 461-463, 23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016, Fukuoka, Japan, 16-12-07.

The investigation of solution process rubrene transistors under different annealing conditions. / Cheng, Yu Han; Lai, Ping Chieh; Tsai, Ping Yin; Fan, Kang Chih; Wang, Yu Wu.

23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016. Society for Information Display, 2016. p. 461-463 (23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016; Vol. 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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N2 - We investigated the characteristics transition of solution processed Rubrene transistors under various annealing temperature and concentrations. Rubrene has been proven as a high potential organic semiconductor. Solution process promises its application in large area coating and cost down. The fabricated device achieved a mobility ∼10-4 cm2/vs and on/off ratio ∼103.

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