The influence of cross-tie wall on the magnetoresistance of patterned permalloy films

J. C. Wu, H. M. Lee

Research output: Contribution to journal › Conference article

Abstract

The influence of cross-tie wall on the magnetoresistance (MR) of patterned permalloy films was discussed. The influence of the magnetic domain structure on the MR curve and the aspect ratio dependence of coercive or saturation fields was also discussed. The higher aspect ratios of the device had shown single domain configuration and a sharp transition in MR curves.

Original languageEnglish
Pages (from-to)EU09
JournalDigests of the Intermag Conference
Publication statusPublished - 2002 Dec 1
Event2002 IEEE International Magnetics Conference-2002 IEEE INTERMAG - Amsterdam, Netherlands
Duration: 2002 Apr 28 → 2002 May 2

Fingerprint

Magnetoresistance
Aspect ratio
Magnetic domains

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

Cite this

Wu, J. C. ; Lee, H. M. / The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. In: Digests of the Intermag Conference. 2002 ; pp. EU09.
@article{f42edfc1e1374b8e8dd87f95757cad02,
title = "The influence of cross-tie wall on the magnetoresistance of patterned permalloy films",
abstract = "The influence of cross-tie wall on the magnetoresistance (MR) of patterned permalloy films was discussed. The influence of the magnetic domain structure on the MR curve and the aspect ratio dependence of coercive or saturation fields was also discussed. The higher aspect ratios of the device had shown single domain configuration and a sharp transition in MR curves.",
author = "Wu, {J. C.} and Lee, {H. M.}",
year = "2002",
month = "12",
day = "1",
language = "English",
pages = "EU09",
journal = "Digests of the Intermag Conference",
issn = "0074-6843",
publisher = "Institute of Electrical and Electronics Engineers Inc.",

}

Wu, JC & Lee, HM 2002, 'The influence of cross-tie wall on the magnetoresistance of patterned permalloy films', Digests of the Intermag Conference, pp. EU09.

The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. / Wu, J. C.; Lee, H. M.

In: Digests of the Intermag Conference, 01.12.2002, p. EU09.

Research output: Contribution to journal › Conference article

TY - JOUR

T1 - The influence of cross-tie wall on the magnetoresistance of patterned permalloy films

AU - Wu, J. C.

AU - Lee, H. M.

PY - 2002/12/1

Y1 - 2002/12/1

N2 - The influence of cross-tie wall on the magnetoresistance (MR) of patterned permalloy films was discussed. The influence of the magnetic domain structure on the MR curve and the aspect ratio dependence of coercive or saturation fields was also discussed. The higher aspect ratios of the device had shown single domain configuration and a sharp transition in MR curves.

AB - The influence of cross-tie wall on the magnetoresistance (MR) of patterned permalloy films was discussed. The influence of the magnetic domain structure on the MR curve and the aspect ratio dependence of coercive or saturation fields was also discussed. The higher aspect ratios of the device had shown single domain configuration and a sharp transition in MR curves.

UR - http://www.scopus.com/inward/record.url?scp=0036912972&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036912972&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0036912972

SP - EU09

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

SN - 0074-6843

ER -

Wu JC, Lee HM. The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. Digests of the Intermag Conference. 2002 Dec 1;EU09.

Access to Document