Abstract
The influence of cross-tie wall on the magnetoresistance (MR) of patterned permalloy films was discussed. The influence of the magnetic domain structure on the MR curve and the aspect ratio dependence of coercive or saturation fields was also discussed. The higher aspect ratios of the device had shown single domain configuration and a sharp transition in MR curves.
| Original language | English |
|---|---|
| Pages (from-to) | EU09 |
| Journal | Digests of the Intermag Conference |
| Publication status | Published - 2002 Dec 1 |
| Event | 2002 IEEE International Magnetics Conference-2002 IEEE INTERMAG - Amsterdam, Netherlands Duration: 2002 Apr 28 → 2002 May 2 |
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
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Wu, J. C., & Lee, H. M. (2002). The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. Digests of the Intermag Conference, EU09.