The influence of cross-tie wall on the magnetoresistance of patterned permalloy films

Jong-Ching Wu, H. M. Lee

Research output: Contribution to journalArticle

Abstract

The influence of cross-tie wall on the magnetoresistance (MR) of patterned permalloy films was discussed. The influence of the magnetic domain structure on the MR curve and the aspect ratio dependence of coercive or saturation fields was also discussed. The higher aspect ratios of the device had shown single domain configuration and a sharp transition in MR curves.

Original languageEnglish
JournalDigests of the Intermag Conference
Publication statusPublished - 2002 Dec 1

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Magnetoresistance
Aspect ratio
Magnetic domains

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

Cite this

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title = "The influence of cross-tie wall on the magnetoresistance of patterned permalloy films",
abstract = "The influence of cross-tie wall on the magnetoresistance (MR) of patterned permalloy films was discussed. The influence of the magnetic domain structure on the MR curve and the aspect ratio dependence of coercive or saturation fields was also discussed. The higher aspect ratios of the device had shown single domain configuration and a sharp transition in MR curves.",
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