@inproceedings{c82a112d70284232a72470e84e51d547,
title = "The influence of cross-tie wall on the magnetoresistance of patterned permalloy films",
abstract = "Driven by the potential applications in data storage and the understanding of the fundamental micromagnetism, nanostructured magnetic thin films have been under intensive investigation. The recent advances in the nanofabrication and microscopy of the magnetic domain structures have led to more optimization of the magnetic field sensors. We present a correlation between the magnetization evolution in patterned elliptical Permalloy elements and their corresponding magnetoresistance (MR).",
author = "Wu, {J. C.} and Lee, {H. M.}",
year = "2002",
month = jan,
day = "1",
doi = "10.1109/INTMAG.2002.1001217",
language = "English",
series = "INTERMAG Europe 2002 - IEEE International Magnetics Conference",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
editor = "J. Fidler and B. Hillebrands and C. Ross and D. Weller and L. Folks and E. Hill and {Vazquez Villalabeitia}, M. and Bain, {J. A.} and {De Boeck}, Jo and R. Wood",
booktitle = "INTERMAG Europe 2002 - IEEE International Magnetics Conference",
address = "United States",
note = "2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 ; Conference date: 28-04-2002 Through 02-05-2002",
}