Abstract
Driven by the potential applications in data storage and the understanding of the fundamental micromagnetism, nanostructured magnetic thin films have been under intensive investigation. The recent advances in the nanofabrication and microscopy of the magnetic domain structures have led to more optimization of the magnetic field sensors. We present a correlation between the magnetization evolution in patterned elliptical Permalloy elements and their corresponding magnetoresistance (MR).
| Original language | English |
|---|---|
| Title of host publication | INTERMAG Europe 2002 - IEEE International Magnetics Conference |
| Editors | J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, Jo De Boeck, R. Wood |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| ISBN (Electronic) | 0780373650, 9780780373655 |
| DOIs | |
| Publication status | Published - 2002 Jan 1 |
| Event | 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands Duration: 2002 Apr 28 → 2002 May 2 |
Publication series
| Name | INTERMAG Europe 2002 - IEEE International Magnetics Conference |
|---|
Other
| Other | 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 |
|---|---|
| Country | Netherlands |
| City | Amsterdam |
| Period | 02-04-28 → 02-05-02 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering
- Surfaces, Coatings and Films
Cite this
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The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. / Wu, J. C.; Lee, H. M.
INTERMAG Europe 2002 - IEEE International Magnetics Conference. ed. / J. Fidler; B. Hillebrands; C. Ross; D. Weller; L. Folks; E. Hill; M. Vazquez Villalabeitia; J. A. Bain; Jo De Boeck; R. Wood. Institute of Electrical and Electronics Engineers Inc., 2002. 1001217 (INTERMAG Europe 2002 - IEEE International Magnetics Conference).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
TY - GEN
T1 - The influence of cross-tie wall on the magnetoresistance of patterned permalloy films
AU - Wu, J. C.
AU - Lee, H. M.
PY - 2002/1/1
Y1 - 2002/1/1
N2 - Driven by the potential applications in data storage and the understanding of the fundamental micromagnetism, nanostructured magnetic thin films have been under intensive investigation. The recent advances in the nanofabrication and microscopy of the magnetic domain structures have led to more optimization of the magnetic field sensors. We present a correlation between the magnetization evolution in patterned elliptical Permalloy elements and their corresponding magnetoresistance (MR).
AB - Driven by the potential applications in data storage and the understanding of the fundamental micromagnetism, nanostructured magnetic thin films have been under intensive investigation. The recent advances in the nanofabrication and microscopy of the magnetic domain structures have led to more optimization of the magnetic field sensors. We present a correlation between the magnetization evolution in patterned elliptical Permalloy elements and their corresponding magnetoresistance (MR).
UR - http://www.scopus.com/inward/record.url?scp=85017216310&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85017216310&partnerID=8YFLogxK
U2 - 10.1109/INTMAG.2002.1001217
DO - 10.1109/INTMAG.2002.1001217
M3 - Conference contribution
AN - SCOPUS:85017216310
T3 - INTERMAG Europe 2002 - IEEE International Magnetics Conference
BT - INTERMAG Europe 2002 - IEEE International Magnetics Conference
A2 - Fidler, J.
A2 - Hillebrands, B.
A2 - Ross, C.
A2 - Weller, D.
A2 - Folks, L.
A2 - Hill, E.
A2 - Vazquez Villalabeitia, M.
A2 - Bain, J. A.
A2 - De Boeck, Jo
A2 - Wood, R.
PB - Institute of Electrical and Electronics Engineers Inc.
ER -