The influence of cross-tie wall on the magnetoresistance of patterned permalloy films

J. C. Wu; H. M. Lee

doi:10.1109/INTMAG.2002.1001217

The influence of cross-tie wall on the magnetoresistance of patterned permalloy films

J. C. Wu, H. M. Lee

Department of Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Driven by the potential applications in data storage and the understanding of the fundamental micromagnetism, nanostructured magnetic thin films have been under intensive investigation. The recent advances in the nanofabrication and microscopy of the magnetic domain structures have led to more optimization of the magnetic field sensors. We present a correlation between the magnetization evolution in patterned elliptical Permalloy elements and their corresponding magnetoresistance (MR).

Original language	English
Title of host publication	INTERMAG Europe 2002 - IEEE International Magnetics Conference
Editors	J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, Jo De Boeck, R. Wood
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	0780373650, 9780780373655
DOIs	https://doi.org/10.1109/INTMAG.2002.1001217
Publication status	Published - 2002 Jan 1
Event	2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands Duration: 2002 Apr 28 → 2002 May 2

Publication series

Name	INTERMAG Europe 2002 - IEEE International Magnetics Conference

Other

Other	2002 IEEE International Magnetics Conference, INTERMAG Europe 2002
Country	Netherlands
City	Amsterdam
Period	02-04-28 → 02-05-02

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering
Surfaces, Coatings and Films

Access to Document

10.1109/INTMAG.2002.1001217

Fingerprint Dive into the research topics of 'The influence of cross-tie wall on the magnetoresistance of patterned permalloy films'. Together they form a unique fingerprint.

Cite this

Wu, J. C., & Lee, H. M. (2002). The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. In J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, J. De Boeck, & R. Wood (Eds.), INTERMAG Europe 2002 - IEEE International Magnetics Conference [1001217] (INTERMAG Europe 2002 - IEEE International Magnetics Conference). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2002.1001217

Wu, J. C. ; Lee, H. M. / The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. INTERMAG Europe 2002 - IEEE International Magnetics Conference. editor / J. Fidler ; B. Hillebrands ; C. Ross ; D. Weller ; L. Folks ; E. Hill ; M. Vazquez Villalabeitia ; J. A. Bain ; Jo De Boeck ; R. Wood. Institute of Electrical and Electronics Engineers Inc., 2002. (INTERMAG Europe 2002 - IEEE International Magnetics Conference).

@inproceedings{c82a112d70284232a72470e84e51d547,

title = "The influence of cross-tie wall on the magnetoresistance of patterned permalloy films",

abstract = "Driven by the potential applications in data storage and the understanding of the fundamental micromagnetism, nanostructured magnetic thin films have been under intensive investigation. The recent advances in the nanofabrication and microscopy of the magnetic domain structures have led to more optimization of the magnetic field sensors. We present a correlation between the magnetization evolution in patterned elliptical Permalloy elements and their corresponding magnetoresistance (MR).",

author = "Wu, {J. C.} and Lee, {H. M.}",

year = "2002",

month = jan,

day = "1",

doi = "10.1109/INTMAG.2002.1001217",

language = "English",

series = "INTERMAG Europe 2002 - IEEE International Magnetics Conference",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

editor = "J. Fidler and B. Hillebrands and C. Ross and D. Weller and L. Folks and E. Hill and {Vazquez Villalabeitia}, M. and Bain, {J. A.} and {De Boeck}, Jo and R. Wood",

booktitle = "INTERMAG Europe 2002 - IEEE International Magnetics Conference",

address = "United States",

note = "2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 ; Conference date: 28-04-2002 Through 02-05-2002",

}

Wu, JC & Lee, HM 2002, The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. in J Fidler, B Hillebrands, C Ross, D Weller, L Folks, E Hill, M Vazquez Villalabeitia, JA Bain, J De Boeck & R Wood (eds), INTERMAG Europe 2002 - IEEE International Magnetics Conference., 1001217, INTERMAG Europe 2002 - IEEE International Magnetics Conference, Institute of Electrical and Electronics Engineers Inc., 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002, Amsterdam, Netherlands, 02-04-28. https://doi.org/10.1109/INTMAG.2002.1001217

The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. / Wu, J. C.; Lee, H. M.

INTERMAG Europe 2002 - IEEE International Magnetics Conference. ed. / J. Fidler; B. Hillebrands; C. Ross; D. Weller; L. Folks; E. Hill; M. Vazquez Villalabeitia; J. A. Bain; Jo De Boeck; R. Wood. Institute of Electrical and Electronics Engineers Inc., 2002. 1001217 (INTERMAG Europe 2002 - IEEE International Magnetics Conference).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - The influence of cross-tie wall on the magnetoresistance of patterned permalloy films

AU - Wu, J. C.

AU - Lee, H. M.

PY - 2002/1/1

Y1 - 2002/1/1

N2 - Driven by the potential applications in data storage and the understanding of the fundamental micromagnetism, nanostructured magnetic thin films have been under intensive investigation. The recent advances in the nanofabrication and microscopy of the magnetic domain structures have led to more optimization of the magnetic field sensors. We present a correlation between the magnetization evolution in patterned elliptical Permalloy elements and their corresponding magnetoresistance (MR).

AB - Driven by the potential applications in data storage and the understanding of the fundamental micromagnetism, nanostructured magnetic thin films have been under intensive investigation. The recent advances in the nanofabrication and microscopy of the magnetic domain structures have led to more optimization of the magnetic field sensors. We present a correlation between the magnetization evolution in patterned elliptical Permalloy elements and their corresponding magnetoresistance (MR).

UR - http://www.scopus.com/inward/record.url?scp=85017216310&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85017216310&partnerID=8YFLogxK

U2 - 10.1109/INTMAG.2002.1001217

DO - 10.1109/INTMAG.2002.1001217

M3 - Conference contribution

AN - SCOPUS:85017216310

T3 - INTERMAG Europe 2002 - IEEE International Magnetics Conference

BT - INTERMAG Europe 2002 - IEEE International Magnetics Conference

A2 - Fidler, J.

A2 - Hillebrands, B.

A2 - Ross, C.

A2 - Weller, D.

A2 - Folks, L.

A2 - Hill, E.

A2 - Vazquez Villalabeitia, M.

A2 - Bain, J. A.

A2 - De Boeck, Jo

A2 - Wood, R.

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002

Y2 - 28 April 2002 through 2 May 2002

ER -

Wu JC, Lee HM. The influence of cross-tie wall on the magnetoresistance of patterned permalloy films. In Fidler J, Hillebrands B, Ross C, Weller D, Folks L, Hill E, Vazquez Villalabeitia M, Bain JA, De Boeck J, Wood R, editors, INTERMAG Europe 2002 - IEEE International Magnetics Conference. Institute of Electrical and Electronics Engineers Inc. 2002. 1001217. (INTERMAG Europe 2002 - IEEE International Magnetics Conference). https://doi.org/10.1109/INTMAG.2002.1001217