Studies of a Slow-Wave Rogowski Coil

Kin Lu Wong, Tsair Rong Chen

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

A Rogowski coil in a conducting shield can be considered as a slow-wave transmission line. By carefully constructing the slow-wave structure in a way that the distributed capacitance becomes large (on the order of nF) and the coil inductance is at least several microhenries, it is possible to obtain a high-sensitivity (a 1 V/A) Rogowski coil for a pulse duration of up to several microseconds. The design and performance of such a slow-wave Rogowski coil are described in this paper. Details of the experimental results for the effects of the terminating resistance on the probe responses are also presented. These results agree with theoretical predictions.

Original languageEnglish
Pages (from-to)219-222
Number of pages4
JournalIEEE Transactions on Plasma Science
Volume18
Issue number2
DOIs
Publication statusPublished - 1990 Jan 1

Fingerprint

coils
stopping
inductance
transmission lines
pulse duration
capacitance
conduction
probes
sensitivity
predictions

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

Cite this

@article{aba4cea92c7441f381634f46bc9198b9,
title = "Studies of a Slow-Wave Rogowski Coil",
abstract = "A Rogowski coil in a conducting shield can be considered as a slow-wave transmission line. By carefully constructing the slow-wave structure in a way that the distributed capacitance becomes large (on the order of nF) and the coil inductance is at least several microhenries, it is possible to obtain a high-sensitivity (a 1 V/A) Rogowski coil for a pulse duration of up to several microseconds. The design and performance of such a slow-wave Rogowski coil are described in this paper. Details of the experimental results for the effects of the terminating resistance on the probe responses are also presented. These results agree with theoretical predictions.",
author = "Wong, {Kin Lu} and Chen, {Tsair Rong}",
year = "1990",
month = "1",
day = "1",
doi = "10.1109/27.131023",
language = "English",
volume = "18",
pages = "219--222",
journal = "IEEE Transactions on Plasma Science",
issn = "0093-3813",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "2",

}

Studies of a Slow-Wave Rogowski Coil. / Wong, Kin Lu; Chen, Tsair Rong.

In: IEEE Transactions on Plasma Science, Vol. 18, No. 2, 01.01.1990, p. 219-222.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Studies of a Slow-Wave Rogowski Coil

AU - Wong, Kin Lu

AU - Chen, Tsair Rong

PY - 1990/1/1

Y1 - 1990/1/1

N2 - A Rogowski coil in a conducting shield can be considered as a slow-wave transmission line. By carefully constructing the slow-wave structure in a way that the distributed capacitance becomes large (on the order of nF) and the coil inductance is at least several microhenries, it is possible to obtain a high-sensitivity (a 1 V/A) Rogowski coil for a pulse duration of up to several microseconds. The design and performance of such a slow-wave Rogowski coil are described in this paper. Details of the experimental results for the effects of the terminating resistance on the probe responses are also presented. These results agree with theoretical predictions.

AB - A Rogowski coil in a conducting shield can be considered as a slow-wave transmission line. By carefully constructing the slow-wave structure in a way that the distributed capacitance becomes large (on the order of nF) and the coil inductance is at least several microhenries, it is possible to obtain a high-sensitivity (a 1 V/A) Rogowski coil for a pulse duration of up to several microseconds. The design and performance of such a slow-wave Rogowski coil are described in this paper. Details of the experimental results for the effects of the terminating resistance on the probe responses are also presented. These results agree with theoretical predictions.

UR - http://www.scopus.com/inward/record.url?scp=0025419823&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0025419823&partnerID=8YFLogxK

U2 - 10.1109/27.131023

DO - 10.1109/27.131023

M3 - Article

AN - SCOPUS:0025419823

VL - 18

SP - 219

EP - 222

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

SN - 0093-3813

IS - 2

ER -