PZT thin film preparation by pulsed DC magnetron sputtering

Y. C. Lin, H. A. Chuang, J. H. Shen

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Pulsed DC magnetron sputtering was used in this study to prepare lead zirconate titanate (Pb(ZrxTi1-x)O3, PZT) thin films. A single metallic target was used for the deposition onto a Pt/Ti/SiO2/Si substrate and parameters such as: pulse frequency, duty cycle, O2/Ar flow ratio controlled so as to analyze the effect of the parameters on thin film deposition rate, crystalline structure and morphology. After the deposition, the thin film was annealed in a rapid thermal annealing (RTA) furnace. The experimental results showed that, when the pulse frequency was in the range of 10 kHz-100 kHz, along with the lowering of frequency and the oxygen argon flow rate ratio, the deposition rate gradually increased and the formation of PZT thin film perovskite phase was enhanced; however, if the oxygen argon flow rate ratio was too high, it caused the PZT thin film to generate a pyrochlore phase. However, when the duty cycle was in the range of 95%-75%, the highest deposition rate and better perovskite phase could be obtained in the range of 75%-80%.

Original languageEnglish
Pages (from-to)921-926
Number of pages6
JournalVacuum
Volume83
Issue number6
DOIs
Publication statusPublished - 2009 Feb 12

Fingerprint

Film preparation
Magnetron sputtering
magnetron sputtering
direct current
Thin films
preparation
Deposition rates
thin films
Argon
Perovskite
flow velocity
Flow rate
argon
Oxygen
cycles
Rapid thermal annealing
oxygen
pulses
furnaces
Furnaces

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

Lin, Y. C. ; Chuang, H. A. ; Shen, J. H. / PZT thin film preparation by pulsed DC magnetron sputtering. In: Vacuum. 2009 ; Vol. 83, No. 6. pp. 921-926.
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PZT thin film preparation by pulsed DC magnetron sputtering. / Lin, Y. C.; Chuang, H. A.; Shen, J. H.

In: Vacuum, Vol. 83, No. 6, 12.02.2009, p. 921-926.

Research output: Contribution to journalArticle

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AU - Chuang, H. A.

AU - Shen, J. H.

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AB - Pulsed DC magnetron sputtering was used in this study to prepare lead zirconate titanate (Pb(ZrxTi1-x)O3, PZT) thin films. A single metallic target was used for the deposition onto a Pt/Ti/SiO2/Si substrate and parameters such as: pulse frequency, duty cycle, O2/Ar flow ratio controlled so as to analyze the effect of the parameters on thin film deposition rate, crystalline structure and morphology. After the deposition, the thin film was annealed in a rapid thermal annealing (RTA) furnace. The experimental results showed that, when the pulse frequency was in the range of 10 kHz-100 kHz, along with the lowering of frequency and the oxygen argon flow rate ratio, the deposition rate gradually increased and the formation of PZT thin film perovskite phase was enhanced; however, if the oxygen argon flow rate ratio was too high, it caused the PZT thin film to generate a pyrochlore phase. However, when the duty cycle was in the range of 95%-75%, the highest deposition rate and better perovskite phase could be obtained in the range of 75%-80%.

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