Pulsed Nd:YAG laser treatment of monocrystalline silicon substrate

Wen Tse Hsiao, Shih Feng Tseng, Kuo Cheng Huang, Yan Hsin Wang, Ming Fei Chen

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

To minimize reflection and increase the opportunity for photovoltaic (PV) devices to absorb incident light, we produced rough-textured surfaces using a pulsed Nd:YAG laser. We investigated the effect of various operating parameters on surface features and optical performance. The parameters investigated were pulse repetition frequency, pulse energy, and textured surface exposure time. Following laser surface treatment, no chemical solution etching or anti-reflective coatings were necessary. Reflectance values were measured by spectrophotometer. Structural properties including surface morphology and surface roughness of the textured surfaces were analyzed by a three-dimensional confocal laser scanning microscope. The resulting surface reflection curves indicated that, of the different laser machining paths, the vertical and circular paths produced identical optical properties in the samples. Surface reflection values decrease as the pulse energy and exposure times increase. By contrast, surface roughness increases with exposure time. An increase in pulse frequency reduces surface roughness, although the extent of the reduction depends upon the pulse energy. Following surface texturing of the monocrystalline silicon samples, the total reflection was reduced from 40% to approximately 10% of incident light. Our experimental results indicate that the rougher surfaces attained by laser surface treatment provide better light-trapping properties for PV devices.

Original languageEnglish
Pages (from-to)223-231
Number of pages9
JournalInternational Journal of Advanced Manufacturing Technology
Volume56
Issue number1-4
DOIs
Publication statusPublished - 2011 Sep 1

Fingerprint

Monocrystalline silicon
Lasers
Substrates
Surface roughness
Surface treatment
Reflective coatings
Texturing
Spectrophotometers
Surface morphology
Structural properties
Etching
Machining
Microscopes
Optical properties
Scanning

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Software
  • Mechanical Engineering
  • Computer Science Applications
  • Industrial and Manufacturing Engineering

Cite this

Hsiao, Wen Tse ; Tseng, Shih Feng ; Huang, Kuo Cheng ; Wang, Yan Hsin ; Chen, Ming Fei. / Pulsed Nd:YAG laser treatment of monocrystalline silicon substrate. In: International Journal of Advanced Manufacturing Technology. 2011 ; Vol. 56, No. 1-4. pp. 223-231.
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Pulsed Nd:YAG laser treatment of monocrystalline silicon substrate. / Hsiao, Wen Tse; Tseng, Shih Feng; Huang, Kuo Cheng; Wang, Yan Hsin; Chen, Ming Fei.

In: International Journal of Advanced Manufacturing Technology, Vol. 56, No. 1-4, 01.09.2011, p. 223-231.

Research output: Contribution to journalArticle

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