Point defect-induced magnetic properties in CuAlO2 films without magnetic impurities

Jie Luo, Yow Jon Lin

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


The magnetic properties of the undoped CuAlO2 thin films with different compositions are examined. In order to understand this phenomenon and to determine the correlation between the magnetic and electrical properties and point defects, the X-ray photoelectron spectroscopy and Hall effect measurements are performed. Combining with Hall effect, X-ray photoelectron spectroscopy and alternating gradient magnetometer measurements, a direct link between the hole concentration, magnetism, copper vacancy (VCu), oxygen vacancy, and interstitial oxygen (Oi) is established. It is shown that an increase in the number of acceptors (VCu and Oi) leads to an increase in the hole concentration. Based on theoretical and experimental investigations, the authors confirmed that both acceptors (VCu and Oi) in CuAlO2 could induce the ferromagnetic behavior at room temperature.

Original languageEnglish
Article number163
JournalApplied Physics A: Materials Science and Processing
Issue number3
Publication statusPublished - 2016 Mar 1

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)

Fingerprint Dive into the research topics of 'Point defect-induced magnetic properties in CuAlO<sub>2</sub> films without magnetic impurities'. Together they form a unique fingerprint.

Cite this