Monodomain configurations due to bias effect in NiO/NiFe microstructures

J. C. Wu; H. W. Huang; Chih Huang Lai; Te Ho Wu

doi:10.1063/1.373211

Monodomain configurations due to bias effect in NiO/NiFe microstructures

J. C. Wu, H. W. Huang, Chih Huang Lai, Te Ho Wu

Department of Physics

Research output: Contribution to journal › Conference article › peer-review

12 Citations (Scopus)

Abstract

Magnetic domain configurations of microstructured permalloy exchange coupled by an antiferromagnetic (NiO) thin film is presented. NiO/NiFe bilayer micrometer array elements were fabricated using electron beam lithography through a lift-off technique. The magnetic force microscopy images of the elliptical and rectangular elements with various aspect ratios showed dipole-like magnetic domain structures. The bright/dark arc contrast associated with the magnetic pole strength was dependent on the anisotropic exchange field. Furthermore, the shape anisotropy can overwhelm anisotropic exchange in patterned elements with a high aspect ratio and thicker permalloy film.

Original language	English
Pages (from-to)	4948-4950
Number of pages	3
Journal	Journal of Applied Physics
Volume	87
Issue number	9 II
DOIs	https://doi.org/10.1063/1.373211
Publication status	Published - 2000 May
Event	44th Annual Conference on Magnetism and Magnetic Materials - San Jose, CA, United States Duration: 1999 Nov 15 → 1999 Nov 18

All Science Journal Classification (ASJC) codes

Physics and Astronomy(all)

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10.1063/1.373211

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title = "Monodomain configurations due to bias effect in NiO/NiFe microstructures",

abstract = "Magnetic domain configurations of microstructured permalloy exchange coupled by an antiferromagnetic (NiO) thin film is presented. NiO/NiFe bilayer micrometer array elements were fabricated using electron beam lithography through a lift-off technique. The magnetic force microscopy images of the elliptical and rectangular elements with various aspect ratios showed dipole-like magnetic domain structures. The bright/dark arc contrast associated with the magnetic pole strength was dependent on the anisotropic exchange field. Furthermore, the shape anisotropy can overwhelm anisotropic exchange in patterned elements with a high aspect ratio and thicker permalloy film.",

author = "Wu, {J. C.} and Huang, {H. W.} and Lai, {Chih Huang} and Wu, {Te Ho}",

year = "2000",

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volume = "87",

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note = "44th Annual Conference on Magnetism and Magnetic Materials ; Conference date: 15-11-1999 Through 18-11-1999",

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T1 - Monodomain configurations due to bias effect in NiO/NiFe microstructures

AU - Wu, J. C.

AU - Huang, H. W.

AU - Lai, Chih Huang

AU - Wu, Te Ho

PY - 2000/5

Y1 - 2000/5

N2 - Magnetic domain configurations of microstructured permalloy exchange coupled by an antiferromagnetic (NiO) thin film is presented. NiO/NiFe bilayer micrometer array elements were fabricated using electron beam lithography through a lift-off technique. The magnetic force microscopy images of the elliptical and rectangular elements with various aspect ratios showed dipole-like magnetic domain structures. The bright/dark arc contrast associated with the magnetic pole strength was dependent on the anisotropic exchange field. Furthermore, the shape anisotropy can overwhelm anisotropic exchange in patterned elements with a high aspect ratio and thicker permalloy film.

AB - Magnetic domain configurations of microstructured permalloy exchange coupled by an antiferromagnetic (NiO) thin film is presented. NiO/NiFe bilayer micrometer array elements were fabricated using electron beam lithography through a lift-off technique. The magnetic force microscopy images of the elliptical and rectangular elements with various aspect ratios showed dipole-like magnetic domain structures. The bright/dark arc contrast associated with the magnetic pole strength was dependent on the anisotropic exchange field. Furthermore, the shape anisotropy can overwhelm anisotropic exchange in patterned elements with a high aspect ratio and thicker permalloy film.

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JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 9 II

T2 - 44th Annual Conference on Magnetism and Magnetic Materials

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