Microstructure and magnetic properties of Co-C nanogranular films

Y. H. Lee, Y. S. Huang, J. F. Min, G. M. Wu, L. Horng

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Nanogranular films of Co-C were fabricated by DC magnetron sputtering at high (30 mTorr) and low (5 mTorr) pressures with Co concentration controlled at about 40 at%. The granular morphology of the as-deposited film remains unchanged, and is altered, respectively, for 30 and 5 mTorr upon annealing. At annealing temperature Ta≥500 °C, the phase is changed from hexagonal closed-pack (HCP) Co to faulted HCP Co plus FCC Co for 30 mTorr, and to Co2C for 5 mTorr. Both the grain size and the coercivity increase with increase in Ta for 30 mTorr. The largest Hc=381 Oe is obtained at Ta=600 °C. Different microstructures and magnetic properties of the films made at the high and low pressures are compared and discussed.

Original languageEnglish
Pages (from-to)e913-e915
JournalJournal of Magnetism and Magnetic Materials
Volume310
Issue number2 SUPPL. PART 3
DOIs
Publication statusPublished - 2007 Mar 1

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Magnetic properties
magnetic properties
microstructure
Microstructure
Annealing
annealing
Coercive force
Magnetron sputtering
coercivity
magnetron sputtering
low pressure
grain size
direct current
Temperature
temperature

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Lee, Y. H. ; Huang, Y. S. ; Min, J. F. ; Wu, G. M. ; Horng, L. / Microstructure and magnetic properties of Co-C nanogranular films. In: Journal of Magnetism and Magnetic Materials. 2007 ; Vol. 310, No. 2 SUPPL. PART 3. pp. e913-e915.
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Microstructure and magnetic properties of Co-C nanogranular films. / Lee, Y. H.; Huang, Y. S.; Min, J. F.; Wu, G. M.; Horng, L.

In: Journal of Magnetism and Magnetic Materials, Vol. 310, No. 2 SUPPL. PART 3, 01.03.2007, p. e913-e915.

Research output: Contribution to journalArticle

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AU - Huang, Y. S.

AU - Min, J. F.

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AB - Nanogranular films of Co-C were fabricated by DC magnetron sputtering at high (30 mTorr) and low (5 mTorr) pressures with Co concentration controlled at about 40 at%. The granular morphology of the as-deposited film remains unchanged, and is altered, respectively, for 30 and 5 mTorr upon annealing. At annealing temperature Ta≥500 °C, the phase is changed from hexagonal closed-pack (HCP) Co to faulted HCP Co plus FCC Co for 30 mTorr, and to Co2C for 5 mTorr. Both the grain size and the coercivity increase with increase in Ta for 30 mTorr. The largest Hc=381 Oe is obtained at Ta=600 °C. Different microstructures and magnetic properties of the films made at the high and low pressures are compared and discussed.

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