Abstract
Nanogranular films of Co-C were fabricated by DC magnetron sputtering at high (30 mTorr) and low (5 mTorr) pressures with Co concentration controlled at about 40 at%. The granular morphology of the as-deposited film remains unchanged, and is altered, respectively, for 30 and 5 mTorr upon annealing. At annealing temperature Ta≥500 °C, the phase is changed from hexagonal closed-pack (HCP) Co to faulted HCP Co plus FCC Co for 30 mTorr, and to Co2C for 5 mTorr. Both the grain size and the coercivity increase with increase in Ta for 30 mTorr. The largest Hc=381 Oe is obtained at Ta=600 °C. Different microstructures and magnetic properties of the films made at the high and low pressures are compared and discussed.
| Original language | English |
|---|---|
| Pages (from-to) | e913-e915 |
| Journal | Journal of Magnetism and Magnetic Materials |
| Volume | 310 |
| Issue number | 2 SUPPL. PART 3 |
| DOIs | |
| Publication status | Published - 2007 Mar 1 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
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Microstructure and magnetic properties of Co-C nanogranular films. / Lee, Y. H.; Huang, Y. S.; Min, J. F.; Wu, G. M.; Horng, L.
In: Journal of Magnetism and Magnetic Materials, Vol. 310, No. 2 SUPPL. PART 3, 01.03.2007, p. e913-e915.Research output: Contribution to journal › Article
TY - JOUR
T1 - Microstructure and magnetic properties of Co-C nanogranular films
AU - Lee, Y. H.
AU - Huang, Y. S.
AU - Min, J. F.
AU - Wu, G. M.
AU - Horng, L.
PY - 2007/3/1
Y1 - 2007/3/1
N2 - Nanogranular films of Co-C were fabricated by DC magnetron sputtering at high (30 mTorr) and low (5 mTorr) pressures with Co concentration controlled at about 40 at%. The granular morphology of the as-deposited film remains unchanged, and is altered, respectively, for 30 and 5 mTorr upon annealing. At annealing temperature Ta≥500 °C, the phase is changed from hexagonal closed-pack (HCP) Co to faulted HCP Co plus FCC Co for 30 mTorr, and to Co2C for 5 mTorr. Both the grain size and the coercivity increase with increase in Ta for 30 mTorr. The largest Hc=381 Oe is obtained at Ta=600 °C. Different microstructures and magnetic properties of the films made at the high and low pressures are compared and discussed.
AB - Nanogranular films of Co-C were fabricated by DC magnetron sputtering at high (30 mTorr) and low (5 mTorr) pressures with Co concentration controlled at about 40 at%. The granular morphology of the as-deposited film remains unchanged, and is altered, respectively, for 30 and 5 mTorr upon annealing. At annealing temperature Ta≥500 °C, the phase is changed from hexagonal closed-pack (HCP) Co to faulted HCP Co plus FCC Co for 30 mTorr, and to Co2C for 5 mTorr. Both the grain size and the coercivity increase with increase in Ta for 30 mTorr. The largest Hc=381 Oe is obtained at Ta=600 °C. Different microstructures and magnetic properties of the films made at the high and low pressures are compared and discussed.
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U2 - 10.1016/j.jmmm.2006.10.947
DO - 10.1016/j.jmmm.2006.10.947
M3 - Article
AN - SCOPUS:33847682181
VL - 310
SP - e913-e915
JO - Journal of Magnetism and Magnetic Materials
JF - Journal of Magnetism and Magnetic Materials
SN - 0304-8853
IS - 2 SUPPL. PART 3
ER -