Abstract
The advances in nanolithography and new techniques in probing magnetic domain structures such as magnetic force microscopy (MFM) have given scientists an unprecedented way towards the understanding of micromagnetism. We present results of magnetic domain configurations probed at remanent states as well as under external magnetic fields in microstructured Permalloy thin films. Special interest is focused on the formation and evolution of vortex states in elliptical elements. Various ellipses were delineated using standard electron beam lithography, followed by a thermal evaporation of permalloy in the absence of an external magnetic field. The patterned films were then transferred onto a SiN-coated Si-substrate through a lift-off process in acetone. A magnetic force microscope equipped with an external electromagnet was used to investigate the magnetization configurations.
| Original language | English |
|---|---|
| Title of host publication | INTERMAG Europe 2002 - IEEE International Magnetics Conference |
| Editors | J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, Jo De Boeck, R. Wood |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| ISBN (Electronic) | 0780373650, 9780780373655 |
| DOIs | |
| Publication status | Published - 2002 Jan 1 |
| Event | 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands Duration: 2002 Apr 28 → 2002 May 2 |
Publication series
| Name | INTERMAG Europe 2002 - IEEE International Magnetics Conference |
|---|
Other
| Other | 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 |
|---|---|
| Country | Netherlands |
| City | Amsterdam |
| Period | 02-04-28 → 02-05-02 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering
- Surfaces, Coatings and Films
Cite this
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Magnetization evolution in microstructured permalloy ellipses. / Wu, J. C.; Shieh, W. Z.; Chang, Ching Ray; Wei, Zung Hang; Usov, N. A.
INTERMAG Europe 2002 - IEEE International Magnetics Conference. ed. / J. Fidler; B. Hillebrands; C. Ross; D. Weller; L. Folks; E. Hill; M. Vazquez Villalabeitia; J. A. Bain; Jo De Boeck; R. Wood. Institute of Electrical and Electronics Engineers Inc., 2002. 1001103 (INTERMAG Europe 2002 - IEEE International Magnetics Conference).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
TY - GEN
T1 - Magnetization evolution in microstructured permalloy ellipses
AU - Wu, J. C.
AU - Shieh, W. Z.
AU - Chang, Ching Ray
AU - Wei, Zung Hang
AU - Usov, N. A.
PY - 2002/1/1
Y1 - 2002/1/1
N2 - The advances in nanolithography and new techniques in probing magnetic domain structures such as magnetic force microscopy (MFM) have given scientists an unprecedented way towards the understanding of micromagnetism. We present results of magnetic domain configurations probed at remanent states as well as under external magnetic fields in microstructured Permalloy thin films. Special interest is focused on the formation and evolution of vortex states in elliptical elements. Various ellipses were delineated using standard electron beam lithography, followed by a thermal evaporation of permalloy in the absence of an external magnetic field. The patterned films were then transferred onto a SiN-coated Si-substrate through a lift-off process in acetone. A magnetic force microscope equipped with an external electromagnet was used to investigate the magnetization configurations.
AB - The advances in nanolithography and new techniques in probing magnetic domain structures such as magnetic force microscopy (MFM) have given scientists an unprecedented way towards the understanding of micromagnetism. We present results of magnetic domain configurations probed at remanent states as well as under external magnetic fields in microstructured Permalloy thin films. Special interest is focused on the formation and evolution of vortex states in elliptical elements. Various ellipses were delineated using standard electron beam lithography, followed by a thermal evaporation of permalloy in the absence of an external magnetic field. The patterned films were then transferred onto a SiN-coated Si-substrate through a lift-off process in acetone. A magnetic force microscope equipped with an external electromagnet was used to investigate the magnetization configurations.
UR - http://www.scopus.com/inward/record.url?scp=85017227502&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85017227502&partnerID=8YFLogxK
U2 - 10.1109/INTMAG.2002.1001103
DO - 10.1109/INTMAG.2002.1001103
M3 - Conference contribution
AN - SCOPUS:85017227502
T3 - INTERMAG Europe 2002 - IEEE International Magnetics Conference
BT - INTERMAG Europe 2002 - IEEE International Magnetics Conference
A2 - Fidler, J.
A2 - Hillebrands, B.
A2 - Ross, C.
A2 - Weller, D.
A2 - Folks, L.
A2 - Hill, E.
A2 - Vazquez Villalabeitia, M.
A2 - Bain, J. A.
A2 - De Boeck, Jo
A2 - Wood, R.
PB - Institute of Electrical and Electronics Engineers Inc.
ER -