Laser patterning indium tin oxide thin films on glass substrate

Ming-Fei Chen, Yu Pin Chen, Wen Tse Hsiao, Zhi Peng Gu

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Laser patterning technology of indium tin oxide thin films has been studied in this research. ITO thin films, which usually coat on the glass and the plastic substrate, have been adopted in the flat panel displays (FPDs) and the plasma display planes. The conventional method of the ITO patterning usually uses the wet chemical etching processing. However, the wet etching processing is not adopted in the plastic materials because the chemical fluid usually damages the plastic substrate. The laser direct writing processing has been developed and replaces the wet etching processing. This investigation is interested in the laser patterning used the third-harmonic Nd:YAG laser (355 nm) to ablate the ITO films of glass substrate. The scanning electron microscope (SEM) measures the characterization of the ablated grooves used the different parameters, including the laser energy, the repetition rate and the feeding speed of the table. Finally, the effect parameters of laser ablating ITO film will be presented in this paper.

Original languageEnglish
Pages (from-to)315-320
Number of pages6
JournalKey Engineering Materials
Volume364-366 I
Publication statusPublished - 2008 Feb 11

Fingerprint

Tin oxides
Indium
Oxide films
Glass
Thin films
Wet etching
Lasers
Substrates
Plastics
Processing
Flat panel displays
indium tin oxide
Electron microscopes
Display devices
Scanning
Plasmas
Fluids

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Chen, M-F., Chen, Y. P., Hsiao, W. T., & Gu, Z. P. (2008). Laser patterning indium tin oxide thin films on glass substrate. Key Engineering Materials, 364-366 I, 315-320.
Chen, Ming-Fei ; Chen, Yu Pin ; Hsiao, Wen Tse ; Gu, Zhi Peng. / Laser patterning indium tin oxide thin films on glass substrate. In: Key Engineering Materials. 2008 ; Vol. 364-366 I. pp. 315-320.
@article{36b2e539e3014ab4953050a1acc65ef3,
title = "Laser patterning indium tin oxide thin films on glass substrate",
abstract = "Laser patterning technology of indium tin oxide thin films has been studied in this research. ITO thin films, which usually coat on the glass and the plastic substrate, have been adopted in the flat panel displays (FPDs) and the plasma display planes. The conventional method of the ITO patterning usually uses the wet chemical etching processing. However, the wet etching processing is not adopted in the plastic materials because the chemical fluid usually damages the plastic substrate. The laser direct writing processing has been developed and replaces the wet etching processing. This investigation is interested in the laser patterning used the third-harmonic Nd:YAG laser (355 nm) to ablate the ITO films of glass substrate. The scanning electron microscope (SEM) measures the characterization of the ablated grooves used the different parameters, including the laser energy, the repetition rate and the feeding speed of the table. Finally, the effect parameters of laser ablating ITO film will be presented in this paper.",
author = "Ming-Fei Chen and Chen, {Yu Pin} and Hsiao, {Wen Tse} and Gu, {Zhi Peng}",
year = "2008",
month = "2",
day = "11",
language = "English",
volume = "364-366 I",
pages = "315--320",
journal = "Key Engineering Materials",
issn = "1013-9826",
publisher = "Trans Tech Publications",

}

Chen, M-F, Chen, YP, Hsiao, WT & Gu, ZP 2008, 'Laser patterning indium tin oxide thin films on glass substrate', Key Engineering Materials, vol. 364-366 I, pp. 315-320.

Laser patterning indium tin oxide thin films on glass substrate. / Chen, Ming-Fei; Chen, Yu Pin; Hsiao, Wen Tse; Gu, Zhi Peng.

In: Key Engineering Materials, Vol. 364-366 I, 11.02.2008, p. 315-320.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Laser patterning indium tin oxide thin films on glass substrate

AU - Chen, Ming-Fei

AU - Chen, Yu Pin

AU - Hsiao, Wen Tse

AU - Gu, Zhi Peng

PY - 2008/2/11

Y1 - 2008/2/11

N2 - Laser patterning technology of indium tin oxide thin films has been studied in this research. ITO thin films, which usually coat on the glass and the plastic substrate, have been adopted in the flat panel displays (FPDs) and the plasma display planes. The conventional method of the ITO patterning usually uses the wet chemical etching processing. However, the wet etching processing is not adopted in the plastic materials because the chemical fluid usually damages the plastic substrate. The laser direct writing processing has been developed and replaces the wet etching processing. This investigation is interested in the laser patterning used the third-harmonic Nd:YAG laser (355 nm) to ablate the ITO films of glass substrate. The scanning electron microscope (SEM) measures the characterization of the ablated grooves used the different parameters, including the laser energy, the repetition rate and the feeding speed of the table. Finally, the effect parameters of laser ablating ITO film will be presented in this paper.

AB - Laser patterning technology of indium tin oxide thin films has been studied in this research. ITO thin films, which usually coat on the glass and the plastic substrate, have been adopted in the flat panel displays (FPDs) and the plasma display planes. The conventional method of the ITO patterning usually uses the wet chemical etching processing. However, the wet etching processing is not adopted in the plastic materials because the chemical fluid usually damages the plastic substrate. The laser direct writing processing has been developed and replaces the wet etching processing. This investigation is interested in the laser patterning used the third-harmonic Nd:YAG laser (355 nm) to ablate the ITO films of glass substrate. The scanning electron microscope (SEM) measures the characterization of the ablated grooves used the different parameters, including the laser energy, the repetition rate and the feeding speed of the table. Finally, the effect parameters of laser ablating ITO film will be presented in this paper.

UR - http://www.scopus.com/inward/record.url?scp=38849099615&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=38849099615&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:38849099615

VL - 364-366 I

SP - 315

EP - 320

JO - Key Engineering Materials

JF - Key Engineering Materials

SN - 1013-9826

ER -