Laser annealing process of ITO thin films using beam shaping technology

Ming-Fei Chen, Keh Moh Lin, Yu Sen Ho

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31 Citations (Scopus)

Abstract

In this study, we develop a laser annealing system for In 2O 3Sn (ITO) to carry out heat treatment on oxides with high melting temperature on substrates with low melting temperature. It is known that the working temperature of traditional heat treatments is usually limited by the melting point of the substrate materials. To overcome this problem, we apply a laser annealing technique to modify the film properties, and to measure the electrical and surface properties, we use Hall measurement, a four-point probe, and an atomic force microscope in our experiment. We will discuss how the annealing is affected by the laser machining parameters, including the beam profile, intensity distribution, laser spot overlap, and laser operation mode. We will further show through experimental results that the beam profile greatly affects the surface roughness of the ITO films. With the use of a uniform beam profile with proper laser intensity, the surface roughness and the sheet resistance of the ITO films can be reduced from 23 nm to 4.2 nm and from 417 Ω/sq to 400.4 Ω/sq, respectively.

Original languageEnglish
Pages (from-to)491-495
Number of pages5
JournalOptics and Lasers in Engineering
Volume50
Issue number3
DOIs
Publication statusPublished - 2012 Mar 1

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics
  • Mechanical Engineering

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