Investigation on the dynamics of cross-tie walls in elliptical permalloy elements

Y. C. Chang; C. C. Chang; W. Z. Hsieh; H. M. Lee; J. C. Wu

doi:10.1109/TMAG.2004.842135

Investigation on the dynamics of cross-tie walls in elliptical permalloy elements

Y. C. Chang, C. C. Chang, W. Z. Hsieh, H. M. Lee, J. C. Wu

Department of Physics

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent Nëel-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of Nëel-type cores.

Original language	English
Pages (from-to)	959-961
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	41
Issue number	2
DOIs	https://doi.org/10.1109/TMAG.2004.842135
Publication status	Published - 2005 Feb 1

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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10.1109/TMAG.2004.842135

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title = "Investigation on the dynamics of cross-tie walls in elliptical permalloy elements",

abstract = "The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent N{\"e}el-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of N{\"e}el-type cores.",

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T1 - Investigation on the dynamics of cross-tie walls in elliptical permalloy elements

AU - Chang, Y. C.

AU - Chang, C. C.

AU - Hsieh, W. Z.

AU - Lee, H. M.

AU - Wu, J. C.

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AB - The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent Nëel-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of Nëel-type cores.

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