Investigation on the dynamics of cross-tie walls in elliptical permalloy elements

Y. C. Chang, C. C. Chang, W. Z. Hsieh, H. M. Lee, Jong-Ching Wu

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent Nëel-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of Nëel-type cores.

Original languageEnglish
Pages (from-to)959-961
Number of pages3
JournalIEEE Transactions on Magnetics
Volume41
Issue number2
DOIs
Publication statusPublished - 2005 Feb 1

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Magnetization reversal
Magnetoresistance
Magnetic force microscopy
Electron beam lithography
Aspect ratio
Direction compound

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Chang, Y. C. ; Chang, C. C. ; Hsieh, W. Z. ; Lee, H. M. ; Wu, Jong-Ching. / Investigation on the dynamics of cross-tie walls in elliptical permalloy elements. In: IEEE Transactions on Magnetics. 2005 ; Vol. 41, No. 2. pp. 959-961.
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Investigation on the dynamics of cross-tie walls in elliptical permalloy elements. / Chang, Y. C.; Chang, C. C.; Hsieh, W. Z.; Lee, H. M.; Wu, Jong-Ching.

In: IEEE Transactions on Magnetics, Vol. 41, No. 2, 01.02.2005, p. 959-961.

Research output: Contribution to journalArticle

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