Abstract
The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent Nëel-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of Nëel-type cores.
| Original language | English |
|---|---|
| Pages (from-to) | 959-961 |
| Number of pages | 3 |
| Journal | IEEE Transactions on Magnetics |
| Volume | 41 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 2005 Feb 1 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering
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Investigation on the dynamics of cross-tie walls in elliptical permalloy elements. / Chang, Y. C.; Chang, C. C.; Hsieh, W. Z.; Lee, H. M.; Wu, J. C.
In: IEEE Transactions on Magnetics, Vol. 41, No. 2, 01.02.2005, p. 959-961.Research output: Contribution to journal › Article
TY - JOUR
T1 - Investigation on the dynamics of cross-tie walls in elliptical permalloy elements
AU - Chang, Y. C.
AU - Chang, C. C.
AU - Hsieh, W. Z.
AU - Lee, H. M.
AU - Wu, J. C.
PY - 2005/2/1
Y1 - 2005/2/1
N2 - The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent Nëel-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of Nëel-type cores.
AB - The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent Nëel-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of Nëel-type cores.
UR - http://www.scopus.com/inward/record.url?scp=14544273195&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=14544273195&partnerID=8YFLogxK
U2 - 10.1109/TMAG.2004.842135
DO - 10.1109/TMAG.2004.842135
M3 - Article
AN - SCOPUS:14544273195
VL - 41
SP - 959
EP - 961
JO - IEEE Transactions on Magnetics
JF - IEEE Transactions on Magnetics
SN - 0018-9464
IS - 2
ER -