Investigation of the cross-tie wall evolution by using magnetic force microscopy and local electrical measurement

C. C. Chang; Y. C. Chang; I. C. Lo; J. C. Wu

doi:10.1016/j.jmmm.2006.11.187

Investigation of the cross-tie wall evolution by using magnetic force microscopy and local electrical measurement

C. C. Chang, Y. C. Chang, I. C. Lo, J. C. Wu

Department of Physics

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Micron-sized permalloy ellipse was fabricated accordingly to form cross-tie walls at as-deposited state, in which the film thickness is 55 nm and the long and short axes are 4 and 2 μ m, respectively. Six non-magnetic current/voltage leads were patched on the ellipse to investigate the magnetization reversal. The transverse magnetoresistance (MR) curve measured with two outermost leads reveal several steps associated with the nucleation and annihilation of cross-tie walls. Probing individual segment of the ellipse makes it possible to classify the contributions of cross-tie wall to the MR. Magnetic force microscopy was utilized to confirm the evolution of cross-tie wall.

Original language	English
Pages (from-to)	2612-2614
Number of pages	3
Journal	Journal of Magnetism and Magnetic Materials
Volume	310
Issue number	2 SUPPL. PART 3
DOIs	https://doi.org/10.1016/j.jmmm.2006.11.187
Publication status	Published - 2007 Mar 1

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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title = "Investigation of the cross-tie wall evolution by using magnetic force microscopy and local electrical measurement",

abstract = "Micron-sized permalloy ellipse was fabricated accordingly to form cross-tie walls at as-deposited state, in which the film thickness is 55 nm and the long and short axes are 4 and 2 μ m, respectively. Six non-magnetic current/voltage leads were patched on the ellipse to investigate the magnetization reversal. The transverse magnetoresistance (MR) curve measured with two outermost leads reveal several steps associated with the nucleation and annihilation of cross-tie walls. Probing individual segment of the ellipse makes it possible to classify the contributions of cross-tie wall to the MR. Magnetic force microscopy was utilized to confirm the evolution of cross-tie wall.",

author = "Chang, {C. C.} and Chang, {Y. C.} and Lo, {I. C.} and Wu, {J. C.}",

year = "2007",

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T1 - Investigation of the cross-tie wall evolution by using magnetic force microscopy and local electrical measurement

AU - Chang, C. C.

AU - Chang, Y. C.

AU - Lo, I. C.

AU - Wu, J. C.

PY - 2007/3/1

Y1 - 2007/3/1

N2 - Micron-sized permalloy ellipse was fabricated accordingly to form cross-tie walls at as-deposited state, in which the film thickness is 55 nm and the long and short axes are 4 and 2 μ m, respectively. Six non-magnetic current/voltage leads were patched on the ellipse to investigate the magnetization reversal. The transverse magnetoresistance (MR) curve measured with two outermost leads reveal several steps associated with the nucleation and annihilation of cross-tie walls. Probing individual segment of the ellipse makes it possible to classify the contributions of cross-tie wall to the MR. Magnetic force microscopy was utilized to confirm the evolution of cross-tie wall.

AB - Micron-sized permalloy ellipse was fabricated accordingly to form cross-tie walls at as-deposited state, in which the film thickness is 55 nm and the long and short axes are 4 and 2 μ m, respectively. Six non-magnetic current/voltage leads were patched on the ellipse to investigate the magnetization reversal. The transverse magnetoresistance (MR) curve measured with two outermost leads reveal several steps associated with the nucleation and annihilation of cross-tie walls. Probing individual segment of the ellipse makes it possible to classify the contributions of cross-tie wall to the MR. Magnetic force microscopy was utilized to confirm the evolution of cross-tie wall.

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