Investigation of the cross-tie wall evolution by using magnetic force microscopy and local electrical measurement

C. C. Chang, Y. C. Chang, I. C. Lo, J. C. Wu

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Micron-sized permalloy ellipse was fabricated accordingly to form cross-tie walls at as-deposited state, in which the film thickness is 55 nm and the long and short axes are 4 and 2 μ m, respectively. Six non-magnetic current/voltage leads were patched on the ellipse to investigate the magnetization reversal. The transverse magnetoresistance (MR) curve measured with two outermost leads reveal several steps associated with the nucleation and annihilation of cross-tie walls. Probing individual segment of the ellipse makes it possible to classify the contributions of cross-tie wall to the MR. Magnetic force microscopy was utilized to confirm the evolution of cross-tie wall.

Original languageEnglish
Pages (from-to)2612-2614
Number of pages3
JournalJournal of Magnetism and Magnetic Materials
Issue number2 SUPPL. PART 3
Publication statusPublished - 2007 Mar 1


All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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