Influences of the aspect ratio and film thickness on switching properties of elliptical permalloy elements

C. C. Chang; Y. C. Chang; W. S. Chung; J. C. Wu; Z. H. Wei; M. F. Lai; C. R. Chang

doi:10.1109/TMAG.2004.842131

Influences of the aspect ratio and film thickness on switching properties of elliptical permalloy elements

C. C. Chang, Y. C. Chang, W. S. Chung, J. C. Wu, Z. H. Wei, M. F. Lai, C. R. Chang

Department of Physics

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

The size dependence on the switching properties of microstructured Permalloy (Ni₈₀Fe₂₀) ellipses were investigated by magnetoresistance measurements and magnetic force microscopy. Elements with fixed short axes of 1 μm, long axes varying from 2 to 10 μm, and film thickness varying from 8 to 55 nm were fabricated by electron beam lithography through a lift-off technique. A single-domain configuration was observed in the elements with the range of aspect ratios (long/short axis) from 5 to 10. More complex domain structures appear in the lower aspect ratio and thicker samples. The switching properties show a strong dependence on the film thickness as well as the aspect ratio. The switching fields of uniform magnetization reversal increase with increasing thickness up to a critical value (24 < t_c < 40 nm), whereas they decrease with increasing thickness above t _c. Nevertheless, the switching fields only show weak dependency on aspect ratio.

Original language	English
Pages (from-to)	947-949
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	41
Issue number	2
DOIs	https://doi.org/10.1109/TMAG.2004.842131
Publication status	Published - 2005 Feb 1

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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10.1109/TMAG.2004.842131

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title = "Influences of the aspect ratio and film thickness on switching properties of elliptical permalloy elements",

abstract = "The size dependence on the switching properties of microstructured Permalloy (Ni80Fe20) ellipses were investigated by magnetoresistance measurements and magnetic force microscopy. Elements with fixed short axes of 1 μm, long axes varying from 2 to 10 μm, and film thickness varying from 8 to 55 nm were fabricated by electron beam lithography through a lift-off technique. A single-domain configuration was observed in the elements with the range of aspect ratios (long/short axis) from 5 to 10. More complex domain structures appear in the lower aspect ratio and thicker samples. The switching properties show a strong dependence on the film thickness as well as the aspect ratio. The switching fields of uniform magnetization reversal increase with increasing thickness up to a critical value (24 < tc < 40 nm), whereas they decrease with increasing thickness above t c. Nevertheless, the switching fields only show weak dependency on aspect ratio.",

author = "Chang, {C. C.} and Chang, {Y. C.} and Chung, {W. S.} and Wu, {J. C.} and Wei, {Z. H.} and Lai, {M. F.} and Chang, {C. R.}",

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AU - Chang, C. C.

AU - Chang, Y. C.

AU - Chung, W. S.

AU - Wu, J. C.

AU - Wei, Z. H.

AU - Lai, M. F.

AU - Chang, C. R.

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N2 - The size dependence on the switching properties of microstructured Permalloy (Ni80Fe20) ellipses were investigated by magnetoresistance measurements and magnetic force microscopy. Elements with fixed short axes of 1 μm, long axes varying from 2 to 10 μm, and film thickness varying from 8 to 55 nm were fabricated by electron beam lithography through a lift-off technique. A single-domain configuration was observed in the elements with the range of aspect ratios (long/short axis) from 5 to 10. More complex domain structures appear in the lower aspect ratio and thicker samples. The switching properties show a strong dependence on the film thickness as well as the aspect ratio. The switching fields of uniform magnetization reversal increase with increasing thickness up to a critical value (24 < tc < 40 nm), whereas they decrease with increasing thickness above t c. Nevertheless, the switching fields only show weak dependency on aspect ratio.

AB - The size dependence on the switching properties of microstructured Permalloy (Ni80Fe20) ellipses were investigated by magnetoresistance measurements and magnetic force microscopy. Elements with fixed short axes of 1 μm, long axes varying from 2 to 10 μm, and film thickness varying from 8 to 55 nm were fabricated by electron beam lithography through a lift-off technique. A single-domain configuration was observed in the elements with the range of aspect ratios (long/short axis) from 5 to 10. More complex domain structures appear in the lower aspect ratio and thicker samples. The switching properties show a strong dependence on the film thickness as well as the aspect ratio. The switching fields of uniform magnetization reversal increase with increasing thickness up to a critical value (24 < tc < 40 nm), whereas they decrease with increasing thickness above t c. Nevertheless, the switching fields only show weak dependency on aspect ratio.

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