Abstract
The size dependence on the switching properties of microstructured Permalloy (Ni80Fe20) ellipses were investigated by magnetoresistance measurements and magnetic force microscopy. Elements with fixed short axes of 1 μm, long axes varying from 2 to 10 μm, and film thickness varying from 8 to 55 nm were fabricated by electron beam lithography through a lift-off technique. A single-domain configuration was observed in the elements with the range of aspect ratios (long/short axis) from 5 to 10. More complex domain structures appear in the lower aspect ratio and thicker samples. The switching properties show a strong dependence on the film thickness as well as the aspect ratio. The switching fields of uniform magnetization reversal increase with increasing thickness up to a critical value (24 < tc < 40 nm), whereas they decrease with increasing thickness above t c. Nevertheless, the switching fields only show weak dependency on aspect ratio.
| Original language | English |
|---|---|
| Pages (from-to) | 947-949 |
| Number of pages | 3 |
| Journal | IEEE Transactions on Magnetics |
| Volume | 41 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 2005 Feb 1 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering
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Influences of the aspect ratio and film thickness on switching properties of elliptical permalloy elements. / Chang, C. C.; Chang, Y. C.; Chung, W. S.; Wu, J. C.; Wei, Z. H.; Lai, M. F.; Chang, C. R.
In: IEEE Transactions on Magnetics, Vol. 41, No. 2, 01.02.2005, p. 947-949.Research output: Contribution to journal › Article
TY - JOUR
T1 - Influences of the aspect ratio and film thickness on switching properties of elliptical permalloy elements
AU - Chang, C. C.
AU - Chang, Y. C.
AU - Chung, W. S.
AU - Wu, J. C.
AU - Wei, Z. H.
AU - Lai, M. F.
AU - Chang, C. R.
PY - 2005/2/1
Y1 - 2005/2/1
N2 - The size dependence on the switching properties of microstructured Permalloy (Ni80Fe20) ellipses were investigated by magnetoresistance measurements and magnetic force microscopy. Elements with fixed short axes of 1 μm, long axes varying from 2 to 10 μm, and film thickness varying from 8 to 55 nm were fabricated by electron beam lithography through a lift-off technique. A single-domain configuration was observed in the elements with the range of aspect ratios (long/short axis) from 5 to 10. More complex domain structures appear in the lower aspect ratio and thicker samples. The switching properties show a strong dependence on the film thickness as well as the aspect ratio. The switching fields of uniform magnetization reversal increase with increasing thickness up to a critical value (24 < tc < 40 nm), whereas they decrease with increasing thickness above t c. Nevertheless, the switching fields only show weak dependency on aspect ratio.
AB - The size dependence on the switching properties of microstructured Permalloy (Ni80Fe20) ellipses were investigated by magnetoresistance measurements and magnetic force microscopy. Elements with fixed short axes of 1 μm, long axes varying from 2 to 10 μm, and film thickness varying from 8 to 55 nm were fabricated by electron beam lithography through a lift-off technique. A single-domain configuration was observed in the elements with the range of aspect ratios (long/short axis) from 5 to 10. More complex domain structures appear in the lower aspect ratio and thicker samples. The switching properties show a strong dependence on the film thickness as well as the aspect ratio. The switching fields of uniform magnetization reversal increase with increasing thickness up to a critical value (24 < tc < 40 nm), whereas they decrease with increasing thickness above t c. Nevertheless, the switching fields only show weak dependency on aspect ratio.
UR - http://www.scopus.com/inward/record.url?scp=14544306458&partnerID=8YFLogxK
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U2 - 10.1109/TMAG.2004.842131
DO - 10.1109/TMAG.2004.842131
M3 - Article
AN - SCOPUS:14544306458
VL - 41
SP - 947
EP - 949
JO - IEEE Transactions on Magnetics
JF - IEEE Transactions on Magnetics
SN - 0018-9464
IS - 2
ER -