In-situ investigation of patterned magnetic domain structures using magnetic force microscope

J. C. Wu, H. W. Huang, Y. W. Huang, Te Ho Wu

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

novel method for in-situ investigation of patterned magnetic domain structures is presented. Micronlength scales of permalloy thin film fabricated by a lift-off process using electron beam lithography were placed on the top and adjacent to an Aluminum strip, A magnetic force microscope was used to take continuous images of the patterned permalloy films while an electrical current was applied in the aluminum strip, with which a magnetic field was established through the patterned permalloy films in the perpendicular and plane direction. As a result, changes of the magnetic domain structures were observed in the presence of the applied magnetic field.

Original languageEnglish
Pages (from-to)3481-3483
Number of pages3
JournalIEEE Transactions on Magnetics
Volume35
Issue number5 PART 2
DOIs
Publication statusPublished - 1999 Dec 1

Fingerprint

Magnetic domains
Aluminum
Microscopes
Magnetic fields
Electron beam lithography
Thin films
Direction compound

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Wu, J. C. ; Huang, H. W. ; Huang, Y. W. ; Wu, Te Ho. / In-situ investigation of patterned magnetic domain structures using magnetic force microscope. In: IEEE Transactions on Magnetics. 1999 ; Vol. 35, No. 5 PART 2. pp. 3481-3483.
@article{8cbb10cda930473f92f3193c5411e810,
title = "In-situ investigation of patterned magnetic domain structures using magnetic force microscope",
abstract = "novel method for in-situ investigation of patterned magnetic domain structures is presented. Micronlength scales of permalloy thin film fabricated by a lift-off process using electron beam lithography were placed on the top and adjacent to an Aluminum strip, A magnetic force microscope was used to take continuous images of the patterned permalloy films while an electrical current was applied in the aluminum strip, with which a magnetic field was established through the patterned permalloy films in the perpendicular and plane direction. As a result, changes of the magnetic domain structures were observed in the presence of the applied magnetic field.",
author = "Wu, {J. C.} and Huang, {H. W.} and Huang, {Y. W.} and Wu, {Te Ho}",
year = "1999",
month = "12",
day = "1",
doi = "10.1109/20.800564",
language = "English",
volume = "35",
pages = "3481--3483",
journal = "IEEE Transactions on Magnetics",
issn = "0018-9464",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "5 PART 2",

}

In-situ investigation of patterned magnetic domain structures using magnetic force microscope. / Wu, J. C.; Huang, H. W.; Huang, Y. W.; Wu, Te Ho.

In: IEEE Transactions on Magnetics, Vol. 35, No. 5 PART 2, 01.12.1999, p. 3481-3483.

Research output: Contribution to journalArticle

TY - JOUR

T1 - In-situ investigation of patterned magnetic domain structures using magnetic force microscope

AU - Wu, J. C.

AU - Huang, H. W.

AU - Huang, Y. W.

AU - Wu, Te Ho

PY - 1999/12/1

Y1 - 1999/12/1

N2 - novel method for in-situ investigation of patterned magnetic domain structures is presented. Micronlength scales of permalloy thin film fabricated by a lift-off process using electron beam lithography were placed on the top and adjacent to an Aluminum strip, A magnetic force microscope was used to take continuous images of the patterned permalloy films while an electrical current was applied in the aluminum strip, with which a magnetic field was established through the patterned permalloy films in the perpendicular and plane direction. As a result, changes of the magnetic domain structures were observed in the presence of the applied magnetic field.

AB - novel method for in-situ investigation of patterned magnetic domain structures is presented. Micronlength scales of permalloy thin film fabricated by a lift-off process using electron beam lithography were placed on the top and adjacent to an Aluminum strip, A magnetic force microscope was used to take continuous images of the patterned permalloy films while an electrical current was applied in the aluminum strip, with which a magnetic field was established through the patterned permalloy films in the perpendicular and plane direction. As a result, changes of the magnetic domain structures were observed in the presence of the applied magnetic field.

UR - http://www.scopus.com/inward/record.url?scp=0033183884&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033183884&partnerID=8YFLogxK

U2 - 10.1109/20.800564

DO - 10.1109/20.800564

M3 - Article

AN - SCOPUS:0033183884

VL - 35

SP - 3481

EP - 3483

JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

SN - 0018-9464

IS - 5 PART 2

ER -