High longitudinal selectivity of shifting multiplexing in volume holograms

Ching Cherng Sun, You Nian Lin, Shih Po Yeh, Wei Chia Su, Yuh Ouyang

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

High longitudinal selectivity of the shifting multiplexing with spherical reference wave is proposed and demonstrated. A simplified method based on wave optics is used for calculating the selectivity, and the result fits well the experimental measurement. Under the paraxial condition, a simple formula for the longitudinal selectivity is introduced. With use of an object lens with effective NA = 0.817, we obtain that an FWHM of selectivity is as small as 1 μm.

Original languageEnglish
Pages (from-to)523-526
Number of pages4
JournalOptics and Laser Technology
Volume34
Issue number7
DOIs
Publication statusPublished - 2002 Oct 1

Fingerprint

Holograms
multiplexing
Multiplexing
selectivity
Full width at half maximum
Lenses
Optics
lenses
optics

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

Sun, Ching Cherng ; Lin, You Nian ; Yeh, Shih Po ; Su, Wei Chia ; Ouyang, Yuh. / High longitudinal selectivity of shifting multiplexing in volume holograms. In: Optics and Laser Technology. 2002 ; Vol. 34, No. 7. pp. 523-526.
@article{0d45eeb527254fcdb2c23cc80bc475c5,
title = "High longitudinal selectivity of shifting multiplexing in volume holograms",
abstract = "High longitudinal selectivity of the shifting multiplexing with spherical reference wave is proposed and demonstrated. A simplified method based on wave optics is used for calculating the selectivity, and the result fits well the experimental measurement. Under the paraxial condition, a simple formula for the longitudinal selectivity is introduced. With use of an object lens with effective NA = 0.817, we obtain that an FWHM of selectivity is as small as 1 μm.",
author = "Sun, {Ching Cherng} and Lin, {You Nian} and Yeh, {Shih Po} and Su, {Wei Chia} and Yuh Ouyang",
year = "2002",
month = "10",
day = "1",
doi = "10.1016/S0030-3992(02)00052-X",
language = "English",
volume = "34",
pages = "523--526",
journal = "Optics and Laser Technology",
issn = "0030-3992",
publisher = "Elsevier Limited",
number = "7",

}

High longitudinal selectivity of shifting multiplexing in volume holograms. / Sun, Ching Cherng; Lin, You Nian; Yeh, Shih Po; Su, Wei Chia; Ouyang, Yuh.

In: Optics and Laser Technology, Vol. 34, No. 7, 01.10.2002, p. 523-526.

Research output: Contribution to journalArticle

TY - JOUR

T1 - High longitudinal selectivity of shifting multiplexing in volume holograms

AU - Sun, Ching Cherng

AU - Lin, You Nian

AU - Yeh, Shih Po

AU - Su, Wei Chia

AU - Ouyang, Yuh

PY - 2002/10/1

Y1 - 2002/10/1

N2 - High longitudinal selectivity of the shifting multiplexing with spherical reference wave is proposed and demonstrated. A simplified method based on wave optics is used for calculating the selectivity, and the result fits well the experimental measurement. Under the paraxial condition, a simple formula for the longitudinal selectivity is introduced. With use of an object lens with effective NA = 0.817, we obtain that an FWHM of selectivity is as small as 1 μm.

AB - High longitudinal selectivity of the shifting multiplexing with spherical reference wave is proposed and demonstrated. A simplified method based on wave optics is used for calculating the selectivity, and the result fits well the experimental measurement. Under the paraxial condition, a simple formula for the longitudinal selectivity is introduced. With use of an object lens with effective NA = 0.817, we obtain that an FWHM of selectivity is as small as 1 μm.

UR - http://www.scopus.com/inward/record.url?scp=0036783448&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036783448&partnerID=8YFLogxK

U2 - 10.1016/S0030-3992(02)00052-X

DO - 10.1016/S0030-3992(02)00052-X

M3 - Article

AN - SCOPUS:0036783448

VL - 34

SP - 523

EP - 526

JO - Optics and Laser Technology

JF - Optics and Laser Technology

SN - 0030-3992

IS - 7

ER -