Abstract
Laser-plasma-produced EUV-radiation has been demonstrated using a pulsed fiber laser. Generated radiation is in the spectral range compatible with 13.5-nm EUV lithography. Fiber lasers can overcome power-scaling limitations of current LPP sources for EUV lithography.
| Original language | English |
|---|---|
| Title of host publication | Conference on Lasers and Electro-Optics, CLEO 2006 |
| Publisher | Optical Society of America |
| ISBN (Print) | 1557528136, 9781557528131 |
| Publication status | Published - 2006 Jan 1 |
| Event | Conference on Lasers and Electro-Optics, CLEO 2006 - Long Beach, CA, United States Duration: 2006 May 21 → 2006 May 21 |
Publication series
| Name | Optics InfoBase Conference Papers |
|---|---|
| ISSN (Electronic) | 2162-2701 |
Other
| Other | Conference on Lasers and Electro-Optics, CLEO 2006 |
|---|---|
| Country | United States |
| City | Long Beach, CA |
| Period | 06-05-21 → 06-05-21 |
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All Science Journal Classification (ASJC) codes
- Instrumentation
- Atomic and Molecular Physics, and Optics
Cite this
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Fiber laser driven EUV generation. / Chang, Yu Chung; Mordovanakis, Aghapi; Hou, Kai Chung; Nees, John; Hou, Bixue; Maksimchuk, Anatoly; Mourou, Gerard; Galvanauskas, Almantas.
Conference on Lasers and Electro-Optics, CLEO 2006. Optical Society of America, 2006. (Optics InfoBase Conference Papers).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
TY - GEN
T1 - Fiber laser driven EUV generation
AU - Chang, Yu Chung
AU - Mordovanakis, Aghapi
AU - Hou, Kai Chung
AU - Nees, John
AU - Hou, Bixue
AU - Maksimchuk, Anatoly
AU - Mourou, Gerard
AU - Galvanauskas, Almantas
PY - 2006/1/1
Y1 - 2006/1/1
N2 - Laser-plasma-produced EUV-radiation has been demonstrated using a pulsed fiber laser. Generated radiation is in the spectral range compatible with 13.5-nm EUV lithography. Fiber lasers can overcome power-scaling limitations of current LPP sources for EUV lithography.
AB - Laser-plasma-produced EUV-radiation has been demonstrated using a pulsed fiber laser. Generated radiation is in the spectral range compatible with 13.5-nm EUV lithography. Fiber lasers can overcome power-scaling limitations of current LPP sources for EUV lithography.
UR - http://www.scopus.com/inward/record.url?scp=84899075570&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84899075570&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:84899075570
SN - 1557528136
SN - 9781557528131
T3 - Optics InfoBase Conference Papers
BT - Conference on Lasers and Electro-Optics, CLEO 2006
PB - Optical Society of America
ER -