Fabrication of electrodes on the aluminum doped zinc oxide thin films using an ultraviolet laser direct-patterning technology

Wen Tse Hsiao, Shih Feng Tseng, Chao Hui Kuo, Kuo Cheng Huang, Donyau Chiang, Pin Chiun Yao, Ming-Fei Chen

Research output: Contribution to journalConference article

7 Citations (Scopus)

Abstract

Because transparent conductive oxide (TCO) thin films have more than 80 % transmittance in visible spectrum, and high electrical conductivity, the TCO films are widely applied to flat panel displays and solar cells as transparent electrode materials. This study aims to develop a direct patterning technology on ZnO:Al (AZO) thin films by a diode-pumped solid state ultraviolet laser. The electrode patterns with array structures on AZO thin films were generated by a high-speed galvanometric scanning system. The optoelectronic properties of a patterned electrode have strong relation with the laser pulse frequency, the scan speed, and the patterning time. The surface morphology and roughness of patterned electrode were measured by three dimension confocal microscope and field emission scanning electron microscope, respectively. The resistivity of AZO thin films before and after laser patterning was measured by a four point probe instrument. The optical transmittance was recorded by a UV/VIS/NIR spectrophotometer. The experimental results indicated that the edge line width and depth decreased with increasing the scan speed. After the array patterns structure were formed by laser dry etching, the roughness Ra values of patterned area increased from 0.06 μm to 0.16 μm. These transmittances of patterned structure from 400 nm to 800 nm wavelengths averagely reached to 82%. The measured results of electrical conductively revealed that the resistivity gradually increased with increasing the pulse repetition frequency. In addition, surface morphologic examination on the straight lines, corners, and etched regions of patterned films revealed no micro-cracks observed which meant the patterned surface had a better surface quality.

Original languageEnglish
Pages (from-to)456-465
Number of pages10
JournalPhysics Procedia
Volume19
DOIs
Publication statusPublished - 2011 Jan 1
EventInternational Conference on Optics in Precision Engineering and Nanotechnology, ICOPEN 2011 - Singapore, Singapore
Duration: 2011 Mar 232011 Mar 25

Fingerprint

ultraviolet lasers
zinc oxides
aluminum
transmittance
fabrication
electrodes
thin films
electrical resistivity
roughness
lasers
flat panel displays
scanning
spectrophotometers
electrode materials
solid state lasers
pulses
visible spectrum
oxide films
field emission
repetition

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Hsiao, Wen Tse ; Tseng, Shih Feng ; Kuo, Chao Hui ; Huang, Kuo Cheng ; Chiang, Donyau ; Yao, Pin Chiun ; Chen, Ming-Fei. / Fabrication of electrodes on the aluminum doped zinc oxide thin films using an ultraviolet laser direct-patterning technology. In: Physics Procedia. 2011 ; Vol. 19. pp. 456-465.
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abstract = "Because transparent conductive oxide (TCO) thin films have more than 80 {\%} transmittance in visible spectrum, and high electrical conductivity, the TCO films are widely applied to flat panel displays and solar cells as transparent electrode materials. This study aims to develop a direct patterning technology on ZnO:Al (AZO) thin films by a diode-pumped solid state ultraviolet laser. The electrode patterns with array structures on AZO thin films were generated by a high-speed galvanometric scanning system. The optoelectronic properties of a patterned electrode have strong relation with the laser pulse frequency, the scan speed, and the patterning time. The surface morphology and roughness of patterned electrode were measured by three dimension confocal microscope and field emission scanning electron microscope, respectively. The resistivity of AZO thin films before and after laser patterning was measured by a four point probe instrument. The optical transmittance was recorded by a UV/VIS/NIR spectrophotometer. The experimental results indicated that the edge line width and depth decreased with increasing the scan speed. After the array patterns structure were formed by laser dry etching, the roughness Ra values of patterned area increased from 0.06 μm to 0.16 μm. These transmittances of patterned structure from 400 nm to 800 nm wavelengths averagely reached to 82{\%}. The measured results of electrical conductively revealed that the resistivity gradually increased with increasing the pulse repetition frequency. In addition, surface morphologic examination on the straight lines, corners, and etched regions of patterned films revealed no micro-cracks observed which meant the patterned surface had a better surface quality.",
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Fabrication of electrodes on the aluminum doped zinc oxide thin films using an ultraviolet laser direct-patterning technology. / Hsiao, Wen Tse; Tseng, Shih Feng; Kuo, Chao Hui; Huang, Kuo Cheng; Chiang, Donyau; Yao, Pin Chiun; Chen, Ming-Fei.

In: Physics Procedia, Vol. 19, 01.01.2011, p. 456-465.

Research output: Contribution to journalConference article

TY - JOUR

T1 - Fabrication of electrodes on the aluminum doped zinc oxide thin films using an ultraviolet laser direct-patterning technology

AU - Hsiao, Wen Tse

AU - Tseng, Shih Feng

AU - Kuo, Chao Hui

AU - Huang, Kuo Cheng

AU - Chiang, Donyau

AU - Yao, Pin Chiun

AU - Chen, Ming-Fei

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AB - Because transparent conductive oxide (TCO) thin films have more than 80 % transmittance in visible spectrum, and high electrical conductivity, the TCO films are widely applied to flat panel displays and solar cells as transparent electrode materials. This study aims to develop a direct patterning technology on ZnO:Al (AZO) thin films by a diode-pumped solid state ultraviolet laser. The electrode patterns with array structures on AZO thin films were generated by a high-speed galvanometric scanning system. The optoelectronic properties of a patterned electrode have strong relation with the laser pulse frequency, the scan speed, and the patterning time. The surface morphology and roughness of patterned electrode were measured by three dimension confocal microscope and field emission scanning electron microscope, respectively. The resistivity of AZO thin films before and after laser patterning was measured by a four point probe instrument. The optical transmittance was recorded by a UV/VIS/NIR spectrophotometer. The experimental results indicated that the edge line width and depth decreased with increasing the scan speed. After the array patterns structure were formed by laser dry etching, the roughness Ra values of patterned area increased from 0.06 μm to 0.16 μm. These transmittances of patterned structure from 400 nm to 800 nm wavelengths averagely reached to 82%. The measured results of electrical conductively revealed that the resistivity gradually increased with increasing the pulse repetition frequency. In addition, surface morphologic examination on the straight lines, corners, and etched regions of patterned films revealed no micro-cracks observed which meant the patterned surface had a better surface quality.

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