Effects of (NH                         4                         )                         2                         S                         x                          treatment on surface work function and roughness of indium-tin-oxide

Yow-Jon Lin; Chang Feng You; Chia Lung Tsai

doi:10.1016/j.apsusc.2006.08.032

Effects of (NH ₄ ) ₂ S _x treatment on surface work function and roughness of indium-tin-oxide

Yow-Jon Lin, Chang Feng You, Chia Lung Tsai

Graduate Institute of Photonics

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

In this study, the effects of an (NH ₄ ) ₂ S _x treatment on the surface work function (SWF) and roughness of indium-tin-oxide (ITO) have been investigated. From the observed X-ray photoelectron spectroscopy results, optical transmittance measurements, atomic force microscopy measurements and four-point probe measurements, it is suggested that the surface chemical changes and an increase in the sheet resistance had strong effects on the SWF of ITO. We find that the S occupation of oxygen vacancies near the ITO surface after (NH ₄ ) ₂ S _x treatment may result in a marked increase in the SWF and a slight increase in the surface roughness.

Original language	English
Pages (from-to)	3957-3961
Number of pages	5
Journal	Applied Surface Science
Volume	253
Issue number	8
DOIs	https://doi.org/10.1016/j.apsusc.2006.08.032
Publication status	Published - 2007 Feb 15

All Science Journal Classification (ASJC) codes

Surfaces, Coatings and Films

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Lin, Y-J., You, C. F., & Tsai, C. L. (2007). Effects of (NH ₄ ) ₂ S _x treatment on surface work function and roughness of indium-tin-oxide Applied Surface Science, 253(8), 3957-3961. https://doi.org/10.1016/j.apsusc.2006.08.032

Lin, Yow-Jon ; You, Chang Feng ; Tsai, Chia Lung. / Effects of (NH ₄ ) ₂ S _x treatment on surface work function and roughness of indium-tin-oxide In: Applied Surface Science. 2007 ; Vol. 253, No. 8. pp. 3957-3961.

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abstract = " In this study, the effects of an (NH 4 ) 2 S x treatment on the surface work function (SWF) and roughness of indium-tin-oxide (ITO) have been investigated. From the observed X-ray photoelectron spectroscopy results, optical transmittance measurements, atomic force microscopy measurements and four-point probe measurements, it is suggested that the surface chemical changes and an increase in the sheet resistance had strong effects on the SWF of ITO. We find that the S occupation of oxygen vacancies near the ITO surface after (NH 4 ) 2 S x treatment may result in a marked increase in the SWF and a slight increase in the surface roughness.",

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Lin, Y-J, You, CF & Tsai, CL 2007, ' Effects of (NH ₄ ) ₂ S _x treatment on surface work function and roughness of indium-tin-oxide ', Applied Surface Science, vol. 253, no. 8, pp. 3957-3961. https://doi.org/10.1016/j.apsusc.2006.08.032

Effects of (NH ₄ ) ₂ S _x treatment on surface work function and roughness of indium-tin-oxide . / Lin, Yow-Jon; You, Chang Feng; Tsai, Chia Lung.

In: Applied Surface Science, Vol. 253, No. 8, 15.02.2007, p. 3957-3961.

Research output: Contribution to journal › Article › peer-review

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AB - In this study, the effects of an (NH 4 ) 2 S x treatment on the surface work function (SWF) and roughness of indium-tin-oxide (ITO) have been investigated. From the observed X-ray photoelectron spectroscopy results, optical transmittance measurements, atomic force microscopy measurements and four-point probe measurements, it is suggested that the surface chemical changes and an increase in the sheet resistance had strong effects on the SWF of ITO. We find that the S occupation of oxygen vacancies near the ITO surface after (NH 4 ) 2 S x treatment may result in a marked increase in the SWF and a slight increase in the surface roughness.

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Lin Y-J, You CF, Tsai CL. Effects of (NH ₄ ) ₂ S _x treatment on surface work function and roughness of indium-tin-oxide Applied Surface Science. 2007 Feb 15;253(8):3957-3961. https://doi.org/10.1016/j.apsusc.2006.08.032