Abstract
In this study, the effects of an (NH 4 ) 2 S x treatment on the surface work function (SWF) and roughness of indium-tin-oxide (ITO) have been investigated. From the observed X-ray photoelectron spectroscopy results, optical transmittance measurements, atomic force microscopy measurements and four-point probe measurements, it is suggested that the surface chemical changes and an increase in the sheet resistance had strong effects on the SWF of ITO. We find that the S occupation of oxygen vacancies near the ITO surface after (NH 4 ) 2 S x treatment may result in a marked increase in the SWF and a slight increase in the surface roughness.
| Original language | English |
|---|---|
| Pages (from-to) | 3957-3961 |
| Number of pages | 5 |
| Journal | Applied Surface Science |
| Volume | 253 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - 2007 Feb 15 |
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All Science Journal Classification (ASJC) codes
- Surfaces, Coatings and Films
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Effects of (NH 4 ) 2 S x treatment on surface work function and roughness of indium-tin-oxide . / Lin, Yow-Jon; You, Chang Feng; Tsai, Chia Lung.
In: Applied Surface Science, Vol. 253, No. 8, 15.02.2007, p. 3957-3961.Research output: Contribution to journal › Article
TY - JOUR
T1 - Effects of (NH 4 ) 2 S x treatment on surface work function and roughness of indium-tin-oxide
AU - Lin, Yow-Jon
AU - You, Chang Feng
AU - Tsai, Chia Lung
PY - 2007/2/15
Y1 - 2007/2/15
N2 - In this study, the effects of an (NH 4 ) 2 S x treatment on the surface work function (SWF) and roughness of indium-tin-oxide (ITO) have been investigated. From the observed X-ray photoelectron spectroscopy results, optical transmittance measurements, atomic force microscopy measurements and four-point probe measurements, it is suggested that the surface chemical changes and an increase in the sheet resistance had strong effects on the SWF of ITO. We find that the S occupation of oxygen vacancies near the ITO surface after (NH 4 ) 2 S x treatment may result in a marked increase in the SWF and a slight increase in the surface roughness.
AB - In this study, the effects of an (NH 4 ) 2 S x treatment on the surface work function (SWF) and roughness of indium-tin-oxide (ITO) have been investigated. From the observed X-ray photoelectron spectroscopy results, optical transmittance measurements, atomic force microscopy measurements and four-point probe measurements, it is suggested that the surface chemical changes and an increase in the sheet resistance had strong effects on the SWF of ITO. We find that the S occupation of oxygen vacancies near the ITO surface after (NH 4 ) 2 S x treatment may result in a marked increase in the SWF and a slight increase in the surface roughness.
UR - http://www.scopus.com/inward/record.url?scp=33846561541&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33846561541&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2006.08.032
DO - 10.1016/j.apsusc.2006.08.032
M3 - Article
AN - SCOPUS:33846561541
VL - 253
SP - 3957
EP - 3961
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
IS - 8
ER -