Effect of Ta underlayer on magnetic properties of FeMn/NiFe films

H. W. Chang; F. T. Yuan; M. T. Chiang; M. C. Chan; S. C. Liou; D. H. Wei; S. W. Liao; P. H. Pan; C. R. Wang; Lance Horng

doi:10.1016/j.surfcoat.2016.03.044

Effect of Ta underlayer on magnetic properties of FeMn/NiFe films

H. W. Chang, F. T. Yuan, M. T. Chiang, M. C. Chan, S. C. Liou, D. H. Wei, S. W. Liao, P. H. Pan, C. R. Wang, Lance Horng

Department of Physics

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

Effect of Ta underlayer on the magnetic properties of sputter-prepared NiFe(5 nm)/FeMn(20 nm) bilayer films have been studied. The magnetic properties of studied films are optimized by modification of working Ar pressure deposition of Ta (P_Ta) in the range of 2–12 mTorr and thickness of Ta (t_Ta) in the range of 0–25 nm. X-ray diffraction results show that the crystallinity of the FeMn(111) strongly depends on the P_Ta and t_Ta. All studied films exhibit smooth and flat surface with root-mean-square roughness below 1 nm due to deposition at RT. Large EB field (H_eb) of 65–123 Oe with small coercivity (H_c) of 5–16 Oe is obtained. Besides, the change of H_eb with various P_Ta and t_Ta are related to the crystallinity of FeMn(111) layer, interfacial roughness, and also strain/stress. Correlation between magnetic properties and microstructure is also discussed. This study suggests that proper Ta underlayer is crucial in the exchange bias for NiFe/FeMn bilayer system.

Original language	English
Pages (from-to)	148-153
Number of pages	6
Journal	Surface and Coatings Technology
Volume	303
DOIs	https://doi.org/10.1016/j.surfcoat.2016.03.044
Publication status	Published - 2016 Oct 15

All Science Journal Classification (ASJC) codes

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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title = "Effect of Ta underlayer on magnetic properties of FeMn/NiFe films",

abstract = "Effect of Ta underlayer on the magnetic properties of sputter-prepared NiFe(5 nm)/FeMn(20 nm) bilayer films have been studied. The magnetic properties of studied films are optimized by modification of working Ar pressure deposition of Ta (PTa) in the range of 2–12 mTorr and thickness of Ta (tTa) in the range of 0–25 nm. X-ray diffraction results show that the crystallinity of the FeMn(111) strongly depends on the PTa and tTa. All studied films exhibit smooth and flat surface with root-mean-square roughness below 1 nm due to deposition at RT. Large EB field (Heb) of 65–123 Oe with small coercivity (Hc) of 5–16 Oe is obtained. Besides, the change of Heb with various PTa and tTa are related to the crystallinity of FeMn(111) layer, interfacial roughness, and also strain/stress. Correlation between magnetic properties and microstructure is also discussed. This study suggests that proper Ta underlayer is crucial in the exchange bias for NiFe/FeMn bilayer system.",

author = "Chang, {H. W.} and Yuan, {F. T.} and Chiang, {M. T.} and Chan, {M. C.} and Liou, {S. C.} and Wei, {D. H.} and Liao, {S. W.} and Pan, {P. H.} and Wang, {C. R.} and Lance Horng",

year = "2016",

month = oct,

day = "15",

doi = "10.1016/j.surfcoat.2016.03.044",

language = "English",

volume = "303",

pages = "148--153",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

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TY - JOUR

T1 - Effect of Ta underlayer on magnetic properties of FeMn/NiFe films

AU - Chang, H. W.

AU - Yuan, F. T.

AU - Chiang, M. T.

AU - Chan, M. C.

AU - Liou, S. C.

AU - Wei, D. H.

AU - Liao, S. W.

AU - Pan, P. H.

AU - Wang, C. R.

AU - Horng, Lance

PY - 2016/10/15

Y1 - 2016/10/15

N2 - Effect of Ta underlayer on the magnetic properties of sputter-prepared NiFe(5 nm)/FeMn(20 nm) bilayer films have been studied. The magnetic properties of studied films are optimized by modification of working Ar pressure deposition of Ta (PTa) in the range of 2–12 mTorr and thickness of Ta (tTa) in the range of 0–25 nm. X-ray diffraction results show that the crystallinity of the FeMn(111) strongly depends on the PTa and tTa. All studied films exhibit smooth and flat surface with root-mean-square roughness below 1 nm due to deposition at RT. Large EB field (Heb) of 65–123 Oe with small coercivity (Hc) of 5–16 Oe is obtained. Besides, the change of Heb with various PTa and tTa are related to the crystallinity of FeMn(111) layer, interfacial roughness, and also strain/stress. Correlation between magnetic properties and microstructure is also discussed. This study suggests that proper Ta underlayer is crucial in the exchange bias for NiFe/FeMn bilayer system.

AB - Effect of Ta underlayer on the magnetic properties of sputter-prepared NiFe(5 nm)/FeMn(20 nm) bilayer films have been studied. The magnetic properties of studied films are optimized by modification of working Ar pressure deposition of Ta (PTa) in the range of 2–12 mTorr and thickness of Ta (tTa) in the range of 0–25 nm. X-ray diffraction results show that the crystallinity of the FeMn(111) strongly depends on the PTa and tTa. All studied films exhibit smooth and flat surface with root-mean-square roughness below 1 nm due to deposition at RT. Large EB field (Heb) of 65–123 Oe with small coercivity (Hc) of 5–16 Oe is obtained. Besides, the change of Heb with various PTa and tTa are related to the crystallinity of FeMn(111) layer, interfacial roughness, and also strain/stress. Correlation between magnetic properties and microstructure is also discussed. This study suggests that proper Ta underlayer is crucial in the exchange bias for NiFe/FeMn bilayer system.

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