Effect of deposition conditions on the characterization of Cu(In,Ga)Se2 precursor films by sputtering process

Yi-Cheng or Y. C. Lin, J. H. Ke, C. C. Chen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

In this study, Cu(In,Ga)Se2 (CIGS) thin films were deposited onto bi-layer Mo coated soda-lime glass by sputtering a chalcopyrite CIGS quaternary alloy target. The influence of sputtering power and substrate temperature on the characterization of CIGS precursor films was investigated. Experimental results demonstrate that the CIGS quaternary target has the characteristics of chalcopyrite structures. The samples deposited at a sputter power of 1.5 W/cm2 (both as-deposited and after annealing) exhibited superior uniformity, and the phenomenon of composition loss resulting from annealing was not drastic. The composition distribution of as-deposited film produced at a substrate temperature 373 K approached that of ideal stoichiometry.

Original languageEnglish
Title of host publicationFrontier in Information Engineering for Mechanics and Materials
Pages63-68
Number of pages6
DOIs
Publication statusPublished - 2012 Oct 11
Event2012 International Conference on Information Engineering for Mechanics and Materials, ICIMM 2012 - Hangzhou, China
Duration: 2012 May 192012 May 22

Publication series

NameApplied Mechanics and Materials
Volume189
ISSN (Print)1660-9336
ISSN (Electronic)1662-7482

Other

Other2012 International Conference on Information Engineering for Mechanics and Materials, ICIMM 2012
CountryChina
CityHangzhou
Period12-05-1912-05-22

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Lin, Y-C. O. Y. C., Ke, J. H., & Chen, C. C. (2012). Effect of deposition conditions on the characterization of Cu(In,Ga)Se2 precursor films by sputtering process. In Frontier in Information Engineering for Mechanics and Materials (pp. 63-68). (Applied Mechanics and Materials; Vol. 189). https://doi.org/10.4028/www.scientific.net/AMM.189.63