Design rule and orientation layout for MEMS curved beams on silicon

Tzung-Ming Chen; Zhenyu Liu; Jan G. Korvink; Ulrike Wallrabe

doi:10.1109/JMEMS.2010.2048416

Design rule and orientation layout for MEMS curved beams on silicon

Tzung-Ming Chen, Zhenyu Liu, Jan G. Korvink, Ulrike Wallrabe

Department of Industrial Education and Technology

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

An analysis method used to choose a suitable structural orientation layout for a microcompliant mechanism, which includes multi-curved-beams, is introduced, particularly, for fabricating microelectromechanical-systems (MEMS) thin-curved-beam microstructures on (100) and (111) single-crystal silicon (SCS) wafers. The achievement of a large deflection of a fabricated SCS device verifies the usability of this design rule. The orientation layouts of the device for a large deflection are restricted to a specific region. Based on the analysis method, it is better to follow a 21° safe region between the (100) and (110) orientations in order to decrease the possibility of crystal slip failure. Using this design consideration, one can design more robust MEMS compliant mechanisms from SCS, exploiting its ideal elasticity.

Original language	English
Article number	5462829
Pages (from-to)	706-714
Number of pages	9
Journal	Journal of Microelectromechanical Systems
Volume	19
Issue number	3
DOIs	https://doi.org/10.1109/JMEMS.2010.2048416
Publication status	Published - 2010 Jun 1

All Science Journal Classification (ASJC) codes

Mechanical Engineering
Electrical and Electronic Engineering

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AU - Wallrabe, Ulrike

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