Atomic-scale epitaxial aluminum film on GaAs substrate

Yen Ting Fan, Ming Cheng Lo, Chu Chun Wu, Peng Yu Chen, Jenq Shinn Wu, Chi Te Liang, Sheng Di Lin

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Atomic-scale metal films exhibit intriguing size-dependent film stability, electrical conductivity, superconductivity, and chemical reactivity. With advancing methods for preparing ultra-thin and atomically smooth metal films, clear evidences of the quantum size effect have been experimentally collected in the past two decades. However, with the problems of small-area fabrication, film oxidation in air, and highly-sensitive interfaces between the metal, substrate, and capping layer, the uses of the quantized metallic films for further ex-situ investigations and applications have been seriously limited. To this end, we develop a large-area fabrication method for continuous atomic-scale aluminum film. The self-limited oxidation of aluminum protects and quantizes the metallic film and enables ex-situ characterizations and device processing in air. Structure analysis and electrical measurements on the prepared films imply the quantum size effect in the atomic-scale aluminum film. Our work opens the way for further physics studies and device applications using the quantized electronic states in metals.

Original languageEnglish
Article number075213
JournalAIP Advances
Volume7
Issue number7
DOIs
Publication statusPublished - 2017 Jul 1

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aluminum
metal films
oxidation
fabrication
air
metals
electrical measurement
superconductivity
reactivity
electrical resistivity
physics
electronics

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Fan, Y. T., Lo, M. C., Wu, C. C., Chen, P. Y., Wu, J. S., Liang, C. T., & Lin, S. D. (2017). Atomic-scale epitaxial aluminum film on GaAs substrate. AIP Advances, 7(7), [075213]. https://doi.org/10.1063/1.4991435
Fan, Yen Ting ; Lo, Ming Cheng ; Wu, Chu Chun ; Chen, Peng Yu ; Wu, Jenq Shinn ; Liang, Chi Te ; Lin, Sheng Di. / Atomic-scale epitaxial aluminum film on GaAs substrate. In: AIP Advances. 2017 ; Vol. 7, No. 7.
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Fan, YT, Lo, MC, Wu, CC, Chen, PY, Wu, JS, Liang, CT & Lin, SD 2017, 'Atomic-scale epitaxial aluminum film on GaAs substrate', AIP Advances, vol. 7, no. 7, 075213. https://doi.org/10.1063/1.4991435

Atomic-scale epitaxial aluminum film on GaAs substrate. / Fan, Yen Ting; Lo, Ming Cheng; Wu, Chu Chun; Chen, Peng Yu; Wu, Jenq Shinn; Liang, Chi Te; Lin, Sheng Di.

In: AIP Advances, Vol. 7, No. 7, 075213, 01.07.2017.

Research output: Contribution to journalArticle

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Fan YT, Lo MC, Wu CC, Chen PY, Wu JS, Liang CT et al. Atomic-scale epitaxial aluminum film on GaAs substrate. AIP Advances. 2017 Jul 1;7(7). 075213. https://doi.org/10.1063/1.4991435