Antireflection coating of SiO2 thin film in dye-sensitized solar cell prepared by liquid phase deposition

Chao Nan Chen, Menq Jion Wu, Chun Fa Hsu, Jung Jie Huang

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


In this study, we present a simple method for producing SiO2 antireflection (AR) coatings functionalized photoanodes by liquid phase deposition (LPD) using a deposition solution of hydrofluosilicic acid (H2SiF6) and boric acid (H3BO3). Antireflection coatings are used in dye-sensitized solar cells (DSSCs) to grad the reflective index between the glass and air interface. The less refractive index of the LPD-SiO2 coating also helps to improve the transmittance of the AR coating. This paper presents a detailed study obtained of DSSCs, with and without this LPD-SiO2 AR coating. Measurements show a short current density gain of 25.39%. The DSSC efficiency was improved from 4.76 to 6.03% with the LPD-SiO2 AR coating.

Original languageEnglish
Pages (from-to)28-33
Number of pages6
JournalSurface and Coatings Technology
Publication statusPublished - 2017 Jun 25

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Antireflection coating of SiO<sub>2</sub> thin film in dye-sensitized solar cell prepared by liquid phase deposition'. Together they form a unique fingerprint.

Cite this