Antireflection coating of SiO2 thin film in dye-sensitized solar cell prepared by liquid phase deposition

Chao Nan Chen, Menq-Jiun Wu, Chun Fa Hsu, Jung Jie Huang

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

In this study, we present a simple method for producing SiO2 antireflection (AR) coatings functionalized photoanodes by liquid phase deposition (LPD) using a deposition solution of hydrofluosilicic acid (H2SiF6) and boric acid (H3BO3). Antireflection coatings are used in dye-sensitized solar cells (DSSCs) to grad the reflective index between the glass and air interface. The less refractive index of the LPD-SiO2 coating also helps to improve the transmittance of the AR coating. This paper presents a detailed study obtained of DSSCs, with and without this LPD-SiO2 AR coating. Measurements show a short current density gain of 25.39%. The DSSC efficiency was improved from 4.76 to 6.03% with the LPD-SiO2 AR coating.

Original languageEnglish
Pages (from-to)28-33
Number of pages6
JournalSurface and Coatings Technology
Volume320
DOIs
Publication statusPublished - 2017 Jun 25

Fingerprint

Antireflection coatings
antireflection coatings
liquid phases
solar cells
dyes
Thin films
Liquids
thin films
boric acids
Boric acid
Refractive index
transmittance
Current density
Dye-sensitized solar cells
refractivity
current density
coatings
Glass
Coatings
acids

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

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abstract = "In this study, we present a simple method for producing SiO2 antireflection (AR) coatings functionalized photoanodes by liquid phase deposition (LPD) using a deposition solution of hydrofluosilicic acid (H2SiF6) and boric acid (H3BO3). Antireflection coatings are used in dye-sensitized solar cells (DSSCs) to grad the reflective index between the glass and air interface. The less refractive index of the LPD-SiO2 coating also helps to improve the transmittance of the AR coating. This paper presents a detailed study obtained of DSSCs, with and without this LPD-SiO2 AR coating. Measurements show a short current density gain of 25.39{\%}. The DSSC efficiency was improved from 4.76 to 6.03{\%} with the LPD-SiO2 AR coating.",
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Antireflection coating of SiO2 thin film in dye-sensitized solar cell prepared by liquid phase deposition. / Chen, Chao Nan; Wu, Menq-Jiun; Hsu, Chun Fa; Huang, Jung Jie.

In: Surface and Coatings Technology, Vol. 320, 25.06.2017, p. 28-33.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Antireflection coating of SiO2 thin film in dye-sensitized solar cell prepared by liquid phase deposition

AU - Chen, Chao Nan

AU - Wu, Menq-Jiun

AU - Hsu, Chun Fa

AU - Huang, Jung Jie

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AB - In this study, we present a simple method for producing SiO2 antireflection (AR) coatings functionalized photoanodes by liquid phase deposition (LPD) using a deposition solution of hydrofluosilicic acid (H2SiF6) and boric acid (H3BO3). Antireflection coatings are used in dye-sensitized solar cells (DSSCs) to grad the reflective index between the glass and air interface. The less refractive index of the LPD-SiO2 coating also helps to improve the transmittance of the AR coating. This paper presents a detailed study obtained of DSSCs, with and without this LPD-SiO2 AR coating. Measurements show a short current density gain of 25.39%. The DSSC efficiency was improved from 4.76 to 6.03% with the LPD-SiO2 AR coating.

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