Antimonidation of ultrathin epitaxial aluminum nanofilms for metamorphic growth of Sb-based structures on GaAs substrates

Research output: Contribution to journal › Article

Original language	English
Journal	Japanese Journal of Applied Physics
Volume	59
Issue number	SG
DOIs	https://doi.org/10.7567/1347-4065/ab65d5
Publication status	Published - 2020

Cite this

@article{502e00abf7b449ab85a55be8a1c797c2,

title = "Antimonidation of ultrathin epitaxial aluminum nanofilms for metamorphic growth of Sb-based structures on GaAs substrates",

author = "Y.-H. Wu and J.-S. Wu and S.-D. Lin",

note = "Export Date: 8 August 2020",

year = "2020",

doi = "10.7567/1347-4065/ab65d5",

language = "English",

volume = "59",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

number = "SG",

}

TY - JOUR

T1 - Antimonidation of ultrathin epitaxial aluminum nanofilms for metamorphic growth of Sb-based structures on GaAs substrates

AU - Wu, Y.-H.

AU - Wu, J.-S.

AU - Lin, S.-D.

N1 - Export Date: 8 August 2020

PY - 2020

Y1 - 2020

U2 - 10.7567/1347-4065/ab65d5

DO - 10.7567/1347-4065/ab65d5

M3 - Article

VL - 59

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

SN - 0021-4922

IS - SG

ER -