Analysis of pull-in characteristics of double-clamped nanobeam incorporating casimir and van der waals effects

Cheng Chi Wang, Chih Jer Lin, Chin-Chia Liu, Chia Chiang Hsu

Research output: Contribution to journalArticle

Abstract

A hybrid numerical scheme comprising the differential transformation method (DTM) and the finite difference (FD) approximation approach is used to analyze the complex nonlinear pull-in behavior of an electrostatically actuated double-clamped nanobeam subject to Casimir and van der Waals force effects and an axial residual stress. It is shown that, for an initial gap size of 50 nm, the pull-in voltage predicted by the hybrid numerical scheme deviates from that predicted by the universal pull-in formula by just 0.2%. In addition, the results show that the Casimir and van der Waals forces both have a significant effect on the steady and dynamic deflection behaviors of the beam as a function of applied voltage. Finally, the minimum allowable gap without the applied voltage of double-clamped nanobeams can be determined.

Original languageEnglish
Pages (from-to)2627-2636
Number of pages10
JournalSensors and Materials
Volume30
Issue number11
DOIs
Publication statusPublished - 2018 Jan 1

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Van der Waals forces
Electric potential
electric potential
axial stress
residual stress
deflection
Residual stresses
approximation

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Materials Science(all)

Cite this

Wang, Cheng Chi ; Lin, Chih Jer ; Liu, Chin-Chia ; Hsu, Chia Chiang. / Analysis of pull-in characteristics of double-clamped nanobeam incorporating casimir and van der waals effects. In: Sensors and Materials. 2018 ; Vol. 30, No. 11. pp. 2627-2636.
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Analysis of pull-in characteristics of double-clamped nanobeam incorporating casimir and van der waals effects. / Wang, Cheng Chi; Lin, Chih Jer; Liu, Chin-Chia; Hsu, Chia Chiang.

In: Sensors and Materials, Vol. 30, No. 11, 01.01.2018, p. 2627-2636.

Research output: Contribution to journalArticle

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