A simple fabrication process of T-shaped gates using a deep-UV/electron-beam/deep-UV tri-layer resist system and electron-beam lithography

Yeong Lin Lai, Edward Y. Chang, Chun Yen Chang, Hung Pin D. Yang, K. Nakamura, S. L. Shy

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

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Engineering & Materials Science

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