Abstract
Nowadays, the precise measurement of the time interval between two events with very fine timing resolution is common challenge in the test and measurement instrumentation. This paper present a new high resolution vernier ring oscillator(VRO), which can measures the clock jitter as the operation temperature rises.The goal of this work focuses on the design of a TDC of temperature stable oscillator and we propose an ultra-low temperature drift of a differential delay cell oscillator based on a proportional to absolute temperature(PTAT) compensation methodology. It is very desirable to have a single integrated circuit producing a stable high resolution timing circuit over a wide temperature range developed in a standard CMOS process. By the simple concept of vernier delay line and two ring oscillators, the proposed can achieve a fine time resolution with wide working temperature. For each channel of ring oscillator, the relative delay time is fine tuned by an external VBIAS input. From 25°C to 45°C, the maximum error percent of delay time without compensation circuits is more than 2.9%, but it with compensation circuits is less than 0.3%. The different operating temperature will affect entire circuit and the delay time of ring oscillator. A compensation circuit to reduce the variety of ring oscillator is also added. The new architecture of high resolution TDC with temperature compensated circuit is proven to be applicable in high precision clock applications which is analyzed and implemented in a CMOS 0.18μm 1P6M process.
| Original language | English |
|---|---|
| Title of host publication | Automatic Manufacturing Systems II |
| Pages | 795-799 |
| Number of pages | 5 |
| DOIs | |
| Publication status | Published - 2012 Nov 9 |
| Event | 2nd International Conference on Advanced Engineering Materials and Technology, AEMT 2012 - Zhuhai, China Duration: 2012 Jul 6 → 2012 Jul 8 |
Publication series
| Name | Advanced Materials Research |
|---|---|
| Volume | 542-543 |
| ISSN (Print) | 1022-6680 |
Other
| Other | 2nd International Conference on Advanced Engineering Materials and Technology, AEMT 2012 |
|---|---|
| Country | China |
| City | Zhuhai |
| Period | 12-07-06 → 12-07-08 |
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All Science Journal Classification (ASJC) codes
- Engineering(all)
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A high resolution vernier ring oscillator with ultra-low temperature drift. / Liu, Rui Hong; Shen, Chih-Hsiung.
Automatic Manufacturing Systems II. 2012. p. 795-799 (Advanced Materials Research; Vol. 542-543).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
TY - GEN
T1 - A high resolution vernier ring oscillator with ultra-low temperature drift
AU - Liu, Rui Hong
AU - Shen, Chih-Hsiung
PY - 2012/11/9
Y1 - 2012/11/9
N2 - Nowadays, the precise measurement of the time interval between two events with very fine timing resolution is common challenge in the test and measurement instrumentation. This paper present a new high resolution vernier ring oscillator(VRO), which can measures the clock jitter as the operation temperature rises.The goal of this work focuses on the design of a TDC of temperature stable oscillator and we propose an ultra-low temperature drift of a differential delay cell oscillator based on a proportional to absolute temperature(PTAT) compensation methodology. It is very desirable to have a single integrated circuit producing a stable high resolution timing circuit over a wide temperature range developed in a standard CMOS process. By the simple concept of vernier delay line and two ring oscillators, the proposed can achieve a fine time resolution with wide working temperature. For each channel of ring oscillator, the relative delay time is fine tuned by an external VBIAS input. From 25°C to 45°C, the maximum error percent of delay time without compensation circuits is more than 2.9%, but it with compensation circuits is less than 0.3%. The different operating temperature will affect entire circuit and the delay time of ring oscillator. A compensation circuit to reduce the variety of ring oscillator is also added. The new architecture of high resolution TDC with temperature compensated circuit is proven to be applicable in high precision clock applications which is analyzed and implemented in a CMOS 0.18μm 1P6M process.
AB - Nowadays, the precise measurement of the time interval between two events with very fine timing resolution is common challenge in the test and measurement instrumentation. This paper present a new high resolution vernier ring oscillator(VRO), which can measures the clock jitter as the operation temperature rises.The goal of this work focuses on the design of a TDC of temperature stable oscillator and we propose an ultra-low temperature drift of a differential delay cell oscillator based on a proportional to absolute temperature(PTAT) compensation methodology. It is very desirable to have a single integrated circuit producing a stable high resolution timing circuit over a wide temperature range developed in a standard CMOS process. By the simple concept of vernier delay line and two ring oscillators, the proposed can achieve a fine time resolution with wide working temperature. For each channel of ring oscillator, the relative delay time is fine tuned by an external VBIAS input. From 25°C to 45°C, the maximum error percent of delay time without compensation circuits is more than 2.9%, but it with compensation circuits is less than 0.3%. The different operating temperature will affect entire circuit and the delay time of ring oscillator. A compensation circuit to reduce the variety of ring oscillator is also added. The new architecture of high resolution TDC with temperature compensated circuit is proven to be applicable in high precision clock applications which is analyzed and implemented in a CMOS 0.18μm 1P6M process.
UR - http://www.scopus.com/inward/record.url?scp=84868358039&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84868358039&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/AMR.542-543.795
DO - 10.4028/www.scientific.net/AMR.542-543.795
M3 - Conference contribution
AN - SCOPUS:84868358039
SN - 9783037854488
T3 - Advanced Materials Research
SP - 795
EP - 799
BT - Automatic Manufacturing Systems II
ER -