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1996

Simple fabrication process of T-shaped gates using a deep-UV/electron-beam/deep-UV tri-layer resist system and electron-beam lithography

Lai, Y-L., Chang, E. Y., Chang, C. Y., Yang, H. P. D., Nakamura, K. & Shy, S. L., 1996 Dec 1, Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers. Aoyagi, Y., Atoda, N., Fukui, T., Komuro, M., Kotera, M. & et al, A. (eds.). 12 B ed. p. 6347-6695 349 p. (Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers; vol. 35, no. 12 B).

Research output: Chapter in Book/Report/Conference proceedingChapter

Electron beam lithography
Electron beams
lithography
electron beams
Fabrication